Nanoteknolojik tozlar, geleneksel malzemelerin mikro düzeyde yeniden yapılandırılmasına olanak tanıyarak, taş gibi doğal malzemelerin performansını ve dayanıklılığını artırmada önemli rol oynar. Bu tozlar, taş yüzeylerinin temizlenmesi, güçlendirilmesi ve özel kaplamalarla korunması gibi uygulamalarda kullanılarak, taş ürünlerin ömrünü uzatır ve estetik değerini yükseltir.
Özellikle mimari restorasyon ve inşaat sektörlerinde, nanoteknolojik tozlar sayesinde eski veya hasar görmüş taş yapıların orijinal görünümünü ve dayanıklılığını geri kazanmak mümkün olmaktadır. Nanoteknoloji, taşın gözenekliliğini ve mekanik özelliklerini optimize ederek, çevresel etkilere karşı daha dirençli ve uzun ömürlü malzemeler elde edilmesini sağlar.
Ayrıca, nanoteknolojik katkılarla üretilen özel kaplamalar, taş yüzeyine su itici, kir tutmaz ve antibakteriyel özellikler kazandırabilir. Böylece, hem doğal taş ürünlerin korunması hem de yeni nesil inşaat malzemelerinin geliştirilmesi mümkün hale gelir.
| Ürün Adı | Ürün Kodu | Kullanım Alanları | Özellikler |
| Graphene Sheet | NK0001 | Elektronik, Batarya Elektrotları, Sensörler | Size: 1 cm x 1 cm, Thickness: 35 µm, Highly Conductive |
| Nitinol Shape Memory Alloy Sheet | NK0002 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 2 mm, AF: -10 – -15°C |
| Magnesium Hydroxide (Mg(OH)2) Micron Powder | NK0003 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95+%, Size: 325 mesh |
| Silicon Carbide (SiC) Micron Powder | NK0004 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99, 9%, Size: 250 µm |
| Nitinol Shape Memory Alloy Sheet | NK0005 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 1 mm, AF: 50-55°C |
| Nitinol Shape Memory Alloy Sheet | NK0006 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 0, 5 mm, AF: 80-85°C |
| Nitinol Shape Memory Alloy Sheet | NK0007 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 0, 5 mm, AF: 35-40°C |
| Magnesium Carbonate (MgCO3) Micron Powder | NK0008 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9+%, Size: 325 mesh |
| Iron Oxide (Fe2O3) Micron Powder | NK0009 | Pigment, Manyetik Malzemeler, Katalizörler | Gamma, Purity 99.9+%, Size: 325 mesh |
| Activated Carbon (C) Nanopowder/Nanoparticles | NK0010 | Genel Endüstriyel Kullanım | Purity: 95%, Size: <100 nm, Charcoal |
| no image available | NK0011 | Genel Endüstriyel Kullanım | |
| Natural Graphite (C) Nanopowder/Nanoparticles | NK0012 | Genel Endüstriyel Kullanım | Purity: 99.9% Size: 380 nm-1.2 um |
| Iron Oxide (Fe3O4) Micron Powder | NK0013 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9+%, Size: 325 mesh |
| Silicon Carbide (SiC) Micron Powder | NK0014 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 325 mesh |
| Nitinol Shape Memory Alloy Sheet | NK0015 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 0, 15 mm, AF: 15-20°C |
| Silicon Carbide (SiC) Micron Powder | NK0016 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99, 9%, Size: 1 µm |
| Antibacterial Nanopowder/Nanoparticles | NK0017 | Genel Endüstriyel Kullanım | Size: 100 nm |
| Copper Tin (Cu:85-Sn:15) Alloy Micron Powder | NK0018 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 325 mesh |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0019 | Genel Endüstriyel Kullanım | Gamma, Purity: 99.55%, Size: 78 nm, Hydrophilic |
| Iron Oxide (Fe2O3) Micron Powder | NK0020 | Pigment, Manyetik Malzemeler, Katalizörler | Gamma, Purity: 99.9+%, Size: 1 µm |
| Graphene Nanoplatelet | NK0021 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9%, Size: 3 nm, S.A: 800 m2/g, Dia: 1.5 μm |
| Coin Style Single Wafer Shipper | NK0022 | Genel Endüstriyel Kullanım | 3’’ / 76 mm , Natural PP |
| Titanium Dioxide (TiO2) Micron Powder | NK0023 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+ %, Size: 325 mesh |
| Copper Tin (Bronze | NK0024 | Genel Endüstriyel Kullanım | Cu:80-Sn:20) Alloy Micron Powder, Purity: 99.95%, Size: 325 mesh |
| Titanium Diboride (TiB2) Micron Powder | NK0025 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 40-50 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0026 | Genel Endüstriyel Kullanım | Purity: 99.95+%, Size: 50-100 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0027 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 10 µm, Fused |
| Coin Style Single Wafer Shipper | NK0028 | Genel Endüstriyel Kullanım | 2’’ / 51 mm , Natural PP |
| Copper (Cu) Micron Powder | NK0029 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh, Spherical |
| Coin Style Single Wafer Shipper | NK0030 | Genel Endüstriyel Kullanım | 5’’ / 125 mm , Natural PP |
| Samarium Oxide (Sm2O3) Micron Powder | NK0031 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Titanium Diboride (TiB2) Micron Powder | NK0032 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 200 mesh |
| Graphene Nanoplatelet | NK0033 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 3 nm, S.A: 320 m2/g, Dia: 1.5 μm |
| Boron Carbide (B4C) Micron Powder | NK0034 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 325 mesh |
| Coin Style Single Wafer Shipper | NK0035 | Genel Endüstriyel Kullanım | 6’’ / 150 mm , Natural PP |
| Coin Style Single Wafer Shipper | NK0036 | Genel Endüstriyel Kullanım | 4’’ / 100 mm , Natural PP |
| Graphene Nanoplatelet | NK0037 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 7 μm |
| Tellurium Dioxide (TeO2) Micron Powder | NK0038 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 1-5 µm |
| Graphene Nanoplatelet | NK0039 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 3 nm, S.A: 530 m2/g, Dia: 1.5 μm |
| Tellurium (Te) Micron Powder | NK0040 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 325 mesh |
| Boron Carbide (B4C) Micron Powder | NK0041 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: < 10 µm |
| Iron Oxide (Fe3O4) Micron Powder | NK0042 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.5+%, Size: 1 µm |
| Nickel (Ni) Micron Powder | NK0043 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 10 µm |
| Silicon Nitride (Si3N4) Micron Powder | NK0044 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.9%, Size: 10 µm |
| Nickel (Ni) Micron Powder | NK0045 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Porous Carbon (C) Nanopowder/Nanoparticles | NK0046 | Genel Endüstriyel Kullanım | Size: 18-38 nm, (Plant) |
| Graphene Sheet | NK0047 | Elektronik, Batarya Elektrotları, Sensörler | Size: 5cm x 5cm, Thickness: 35 µm, Highly Conductive |
| Nanocalcite | NK0048 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: <200 nm |
| Silicon Nitride (Si3N4) Micron Powder | NK0049 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.9%, Size: 325 mesh |
| Strontium Titanate (SrTiO3) Micron Powder | NK0050 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 3 µm |
| Boron Carbide (B4C) Micron Powder | NK0051 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 250 µm |
| Graphene Nanoplatelet | NK0052 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 30 μm |
| Conductive Carbon Black Nanopowder/Nanoparticles | NK0053 | Genel Endüstriyel Kullanım | Purity: 95%, Size: 148 nm (Plant) |
| Silicon (Si) Micron Powder | NK0054 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99 %, Size: 325 mesh |
| Graphene Nanoplatelet | NK0055 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 7 μm |
| AZ91 Magnesium Alloy Powder | NK0056 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 15-53 μm |
| Graphite Micron Powder | NK0057 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5-10 µm |
| Graphene Nanoplatelet | NK0058 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 18 μm |
| Water-_19_.webp | NK0059 | Genel Endüstriyel Kullanım | |
| Lanthanum Oxide (La2O3) Micron Powder | NK0060 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-10 μm |
| Titanium Carbide (TiC) Micron Powder | NK0061 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99, 9+%, Size: 325 mesh |
| Graphene Nanoplatelet | NK0062 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 18 μm |
| Cobalt (Co) Nanopowder/Nanoparticles | NK0063 | Genel Endüstriyel Kullanım | Purity: 99.85%, Size: 28 nm, Partially Passivated |
| Hydroxyapatite Powder | NK0064 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 40-50 µm |
| Hydroxyapatite Powder | NK0065 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 10-20 µm |
| Copper Oxide (CuO) Nanopowder/Nanoparticles | NK0066 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 38 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0067 | Genel Endüstriyel Kullanım | Alpha, Purity: 99.5+%, Size: 78 nm, Hydrophilic |
| Graphene Nanoplatelet | NK0068 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 30 μm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0069 | Genel Endüstriyel Kullanım | Gamma, Purity: 99.5+%, Size: 18 nm, Hydrophilic |
| Manganese (Mn) Micron Powder | NK0070 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 35 µm, Metal Basis |
| Indium Hydroxide (In(OH)3) Micron Powder | NK0071 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Sulphur (S) Micron Powder | NK0072 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh |
| Zinc (Zn) Micron Powder | NK0073 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3 µm |
| Tungsten Carbide (WC) Micron Powder | NK0074 | Genel Endüstriyel Kullanım | Purity: 99, 9%, Size: -325 mesh |
| Molybdenum (Mo) Micron Powder | NK0075 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1-10 µm, Metal Basis |
| Barium Ferrite (BaFe12O19) Micron Powder | NK0076 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1-3 µm |
| Titanium Carbide (TiC) Micron Powder | NK0077 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1 µm |
| Nickel (Ni) Micron Powder | NK0078 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 500 Mesh, Spherical |
| Titanium Hydride (TiH2) Micron Powder | NK0079 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 325 mesh |
| Activated Carbon (C) Nanopowder/Nanoparticles | NK0080 | Genel Endüstriyel Kullanım | Size: < 90 nm, Coconut |
| Graphene Sheet | NK0081 | Elektronik, Batarya Elektrotları, Sensörler | Size: 10 cm x 10 cm, Thickness: 35 µm, Highly Conductive |
| Aluminum Oxide (Al2O3) Micron Powder | NK0082 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: Sub-Micron, Fused |
| Silicon Dioxide(SiO2) Micron Powder | NK0083 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: -325 mesh, Purity: 99.9% |
| PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene | NK0084 | Genel Endüstriyel Kullanım | (C2F4)n)], Purity: 99.9% |
| Chromium (Cr) Micron Powder | NK0085 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 100 mesh |
| Conductive Bakelite Powder | NK0086 | Genel Endüstriyel Kullanım | |
| Hydroxyapatite Micron Powder | NK0087 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 3 µm |
| Strontium Iron Oxide (SrFe12O19) Micron Powder | NK0088 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9+%, Size: 1-3 µm |
| Barium (Ba) Micron Powder | NK0089 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 325 mesh |
| Zinc (Zn) Micron Powder | NK0090 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh |
| Aluminum (Al) Micron Powder | NK0091 | Genel Endüstriyel Kullanım | Purity: 99.9+ %, Size: 55 µm |
| Copper Oxide (CuO) Micron Powder | NK0092 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 20 µm |
| Aluminum (Al) Micron Powder | NK0093 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 20-35 µm |
| Cuprous Oxide (Cu2O) Micron Powder | NK0094 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: -200 mesh |
| Neodymium (Nd) Micron Powder | NK0095 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Aluminum (Al) Micron Powder | NK0096 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1-2 µm |
| Boron Carbide (B4C) Micron Powder | NK0097 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 1-3 µm |
| Calcium Oxide (CaO) Micron Powder | NK0098 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95+ %, Size: < 5 µm |
| Molybdenum Disilicide (MoSi2) Micron Powder | NK0099 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1-10 µm |
| Silicon Dioxide (SiO2) Micron Powder | NK0100 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: <15 Micron, Purity: 99.8% |
| Aluminum (Al) Micron Powder | NK0101 | Genel Endüstriyel Kullanım | Purity: 99.9+ %, Size: 30 µm |
| Niobium (Nb) Micron Powder | NK0102 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 45 µm, Metal Basis |
| Sodium Dodecyl Sulfate Micron Powder | NK0103 | Genel Endüstriyel Kullanım | Size: -325 mesh |
| Chromium(III) oxide (Cr2O3) Micron Powder | NK0104 | Genel Endüstriyel Kullanım | Purity: 99%, Average Particle Size: 4.5µm |
| Carbon Nanotubes Doped with 12 wt% Graphene Nanopowder/Nanoparticles | NK0105 | Elektronik, Batarya Elektrotları, Sensörler | |
| Lithium Metaborate (LiBO2) Nanopowder/Nanoparticles | NK0106 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: 500 nm, Metals Basis |
| Niobium (Nb) Micron Powder | NK0107 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 10 µm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water | NK0108 | Genel Endüstriyel Kullanım | Alpha, Size: 28 nm, 22 wt% |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0109 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 90 nm, Cubic |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0110 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 280 nm, Tetragonal |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0111 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 370 nm, Tetragonal |
| Molybdenum Disulfide (MoS2) Micron Powder | NK0112 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 325 mesh |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0113 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 500 nm, Tetragonal |
| Silicon (Si) Micron Powder | NK0114 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.95%, Size: 1-3 um, Polycrystalline |
| Aluminum (Al) Micron Powder | NK0115 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 100 mesh |
| Aluminum (Al) Micron Powder | NK0116 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 70 µm |
| Nickel Iron Oxide (NiFe2O4) Nanopowder/Nanoparticles | NK0117 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 98.99%, Size: 25 nm |
| Bismuth (Bi) Micron Powder | NK0118 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 200 mesh |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0119 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5+%, Size: < 55 nm |
| Iron Oxide (Fe3O4) Nanopowder/Nanoparticles | NK0120 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 98.45+%, Size: 18-28 nm |
| Iron Oxide (Fe2O3) Nanopowder/Nanoparticles | NK0121 | Pigment, Manyetik Malzemeler, Katalizörler | Gamma, Purity: 99.55%, Size: 18-38 nm |
| Antimony (III) Oxide (Sb2O3) Micron Powder | NK0122 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3 µm |
| Graphite (C) Micron Powder | NK0123 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1-5 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0124 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 600-850 μm |
| Phosphorus (P) Micron Powder | NK0125 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1 µm, Metal Basis |
| Aluminum Oxide (Al2O3) Micron Powder | NK0126 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 300-425 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0127 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 250-355 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0128 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 212-300 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0129 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 180-250 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0130 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 850-1180 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0131 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 150-212 μm |
| Lithium Hydroxide | NK0132 | Genel Endüstriyel Kullanım | Monohydrate (Battery Grade, LiOH.H2O), Purity: ≥ 99.0% |
| Aluminum Oxide (Al2O3) Micron Powder | NK0133 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 125-180 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0134 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 90-125 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0135 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 63-106 μm |
| Silicon (Si) Micron Powder | NK0136 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99 %, Size: 10 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0137 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 53-90 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0138 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1180-1700 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0139 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1400-2000 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0140 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 45-75 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0141 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 34-82 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0142 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 28-70 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0143 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 22-59 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0144 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 16-49 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0145 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 12-40 μm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0146 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Micron Powder | NK0147 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 8-32 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0148 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 5-25 μm |
| Activated Carbon Micron Powder | NK0149 | Genel Endüstriyel Kullanım | Size: 8-30 Mesh |
| Aluminum Oxide (Al2O3) Micron Powder | NK0150 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 3-19 μm |
| Zinc (Zn) Micron Powder | NK0151 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 200 mesh |
| Aluminum Oxide (Al2O3) Micron Powder | NK0152 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 2-14 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0153 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 355-500 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0154 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 425-600 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0155 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 500-710 μm |
| Tantalum (Ta) Micron Powder | NK0156 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 3 µm |
| Nickel Chromium (Ni-Cr) Alloy Micron Powder | NK0157 | Genel Endüstriyel Kullanım | Size: 325 mesh, Ni-80%, Cr-20% |
| Tin (Sn) Micron Powder | NK0158 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 1 µm |
| Zinc (Zn) Nanopowder/Nanoparticles | NK0159 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 790 nm |
| Gadolinium Oxide (Gd2O3) Micron Powder | NK0160 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Zinc Iron Oxide (ZnFe2O4) Nanopowder/Nanoparticles | NK0161 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 98.7%, Size: 8-28 nm |
| Aluminum (Al) Micron Powder | NK0162 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 80 µm |
| Iron (Fe) Micron Powder | NK0163 | Genel Endüstriyel Kullanım | Purity: 99.5+ %, Size: 325 mesh |
| Aluminum (Al) Micron Powder | NK0164 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: 14 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0165 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 106-150 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0166 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1000-1400 μm |
| Nickel Oxide (NiO) Micron Powder | NK0167 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 200 mesh, Black |
| Manganese (Mn) Micron Powder | NK0168 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 10 µm |
| Calcium Oxide (CaO) Micron Powder | NK0169 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9 %, Size: 325 mesh |
| Holmium (Ho) Micron Powder | NK0170 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0171 | Elektronik, Yarı İletkenler, Optik Malzemeler | S-type, Spherical, Purity: 99.95+%, Size: 13-22 nm, Nonporous and Amorphous |
| Aluminum Oxide (Al2O3) Micron Powder | NK0172 | Genel Endüstriyel Kullanım | Alpha, Purity: 99.9%, Size: 20 µm |
| Aluminum (Al) Micron Powder | NK0173 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 9-11 µm |
| Tantalum (Ta) Micron Powder | NK0174 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 10 µm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0175 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.65+%, Size: 13-23 nm, Porous and Amorphous |
| Calcium Copper Titanate (CaCu3Ti4O12) Micron Powder | NK0176 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | D50:1-3um, Purity: ≥ 99.5 % |
| Samarium Oxide (Sm2O3) Nanopowder/Nanoparticles | NK0177 | Genel Endüstriyel Kullanım | Purity: 99.955%, Size: 13-47 nm |
| Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles | NK0178 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8-110 nm |
| Multi Walled Carbon Nanotubes | NK0179 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0180 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Micron Powder | NK0181 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 20 µm |
| Tin (Sn) Micron Powder | NK0182 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 15 µm |
| Zinc Oxide (ZnO) Micron Powder | NK0183 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 325 mesh, White |
| Molybdenum Trioxide (MoO3) Micron Powder | NK0184 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Silver (Ag) Nanopowder/Nanoparticles | NK0185 | Genel Endüstriyel Kullanım | Purity: 99.95+%, Size: 20 nm, metal basis |
| (-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0186 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 20-40 nm |
| Carbon Nanofibers | NK0187 | Genel Endüstriyel Kullanım | Purity: > 95%, Outside Diameter: 50-150 nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0188 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| Aluminum (Al) Micron Powder | NK0189 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh, Spherical |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0190 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Zirconium (Zr) Micron Powder | NK0191 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 80 µm, Metal Basis |
| Activated Carbon Micron Powder | NK0192 | Genel Endüstriyel Kullanım | Size: 4000 µm |
| Vulcan XC72 Conductive Carbon Black | NK0193 | Genel Endüstriyel Kullanım | |
| Lanthanum Oxide (La2O3) Nanopowder/Nanoparticles | NK0194 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 8-190 nm |
| Cobalt (Co) Micron Powder | NK0195 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 10 µm |
| Boron Nitride (BN) Micron Powder | NK0196 | Genel Endüstriyel Kullanım | Purity: 99.7%, Size: 40-50 µm, Hexagonal |
| Activated Carbon Micron Powder | NK0197 | Genel Endüstriyel Kullanım | Size: 2000 µm |
| Copper (Cu) Nanopowder/Nanoparticles | NK0198 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 780 nm, Metal Basis |
| Zinc Ferrite (ZnFe2O4) Micron Powder | NK0199 | Genel Endüstriyel Kullanım | Zinc Iron Oxide Micron Powder, -200 mesh, 99.9% |
| Activated Carbon Micron Powder | NK0200 | Genel Endüstriyel Kullanım | Size: 1500 µm |
| Silver (Ag) Nanopowder/Nanoparticles | NK0201 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 28-48 nm, Metal Basis |
| Titanium Dioxide (TiO2) Micron Powder | NK0202 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 20 µm |
| Silver (Ag) Nanopowder/Nanoparticles | NK0203 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 28-48 nm, w/~0.25% PVP |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0204 | Genel Endüstriyel Kullanım | Alpha, High Purity: 99.95%, Size: 290 nm, Hydrophilic |
| Polyether Ether Ketone (PEEK) Micron Powder | NK0205 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: <325 mesh |
| Silver (Ag) Nanopowder/Nanoparticles | NK0206 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 48-78 nm, metal basis |
| Barium Carbonate (BaCO3) Nanopowder/Nanoparticles | NK0207 | Genel Endüstriyel Kullanım | Purity: 99.98%, Size: 780 nm |
| Aluminum (Al) Micron Powder | NK0208 | Genel Endüstriyel Kullanım | Purity: 99.9+ %, Size: 7 µm |
| Cadmium (Cd) Micron Powder | NK0209 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 200 mesh, Irregular |
| Iron (Fe) Nanopowder/Nanoparticles | NK0210 | Genel Endüstriyel Kullanım | Purity: 99.55%, Size: 790 nm |
| Chromium (Cr) Micron Powder | NK0211 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 10 µm |
| Silver (Ag) Nanopowder/Nanoparticles | NK0212 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 18 nm, w/~0.25% PVP |
| Tungsten Disulfide Micron powder | NK0213 | Genel Endüstriyel Kullanım | WS2, 99.9%, 325 mesh |
| Tin Oxide (SnO2) Nanopowder/Nanoparticles | NK0214 | Genel Endüstriyel Kullanım | High Purity: 99.87%, Size: 30-60 nm |
| Aluminum (Al) Micron Powder | NK0215 | Genel Endüstriyel Kullanım | Purity: 99.9+ %, Size: 5 µm |
| Copper Oxide (CuO) Nanopowder/Nanoparticles | NK0216 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: < 77 nm |
| Magnesium Hydroxide (Mg(OH)2) Nanopowder/Nanoparticles | NK0217 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5%, Size: 8 nm |
| Silver (Ag) Micron Powder | NK0218 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: Sub-Micron |
| Lithium Titanium Oxide (Li4Ti5O12) Micron Powder for Li-ion Battery Anode (LTO) | NK0219 | Seramik, Yarı İletken, Kimyasal Endüstri | |
| Bismuth Oxide (Bi2O3) Nanopowder/Nanoparticles | NK0220 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 75-195 nm |
| Aluminum Hydroxide (Al(OH)3) Nanopowder/Nanoparticles | NK0221 | Genel Endüstriyel Kullanım | High Purity: 99.95%, Size: 8-18 nm, Hydrophilic |
| Silver-_Ag_-Micron-Powder-99.9_-1-3-um.webp | NK0222 | Genel Endüstriyel Kullanım | |
| Silver (Ag) Micron Powder | NK0223 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 1-3 µm |
| Porous Carbon (C) Nanopowder/Nanoparticles | NK0224 | Genel Endüstriyel Kullanım | Purity: 95%, Size: 55-75 nm, (Plant) |
| Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles | NK0225 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 13-57 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0226 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Purity: 98.5+%, Size: 55-75 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0227 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Purity: 99.5+%, Size: 15-35 nm |
| Tungsten Oxide (WO3) Nanopowder/Nanoparticles | NK0228 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 55 nm, Tetragonal |
| Selenium (Se) Micron Powder | NK0229 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh |
| Zirconium Hydride (ZrH2) Micron Powder | NK0230 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Thickness: 1- 10 µm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0231 | Genel Endüstriyel Kullanım | Alpha, High Purity: 99.95%, Size: 136 nm, Hydrophilic |
| Titanium (Ti) Micron Powder | NK0232 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 325 mesh |
| Antimony (Sb) Micron Powder | NK0233 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Silicon (Si) Nanopowder/Nanoparticles | NK0234 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 90nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0235 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0236 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Manganese Iron Oxide (MnFe2O4) Nanopowder/Nanoparticles | NK0237 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 98.95%, Size: 55 nm |
| Nickel (Ni) Micron Powder | NK0238 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 325 mesh, Spherical |
| Boron (B) Nanopowder/Nanoparticles | NK0239 | Genel Endüstriyel Kullanım | Purity: 99.55+%, Size: 450 nm |
| Silicon Carbide (SiC) Micron Powder | NK0240 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 34-82 μm |
| Graphite (C) Micron Powder | NK0241 | Genel Endüstriyel Kullanım | Purity: ≥99.99%, Size: < 45 μm |
| Silicon Carbide (SiC) Micron Powder | NK0242 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 1400-2000 μm |
| Silicon Carbide (SiC) Micron Powder | NK0243 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+% , Size: 1180-1700 μm |
| Silicon Carbide (SiC) Micron Powder | NK0244 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 1000-1400 μm |
| Silicon Carbide (SiC) Micron Powder | NK0245 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 850-1180 μm |
| Silicon Carbide (SiC) Micron Powder | NK0246 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 600-850 μm |
| Silicon Carbide (SiC) Micron Powder | NK0247 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 500-710 μm |
| Silicon Carbide (SiC) Micron Powder | NK0248 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 425-600 μm |
| Silicon Carbide (SiC) Micron Powder | NK0249 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 355-500 μm |
| Silicon Carbide (SiC) Micron Powder | NK0250 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 300-425 μm |
| Silicon Carbide (SiC) Micron Powder | NK0251 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 250-355 μm |
| Silicon Carbide (SiC) Micron Powder | NK0252 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 212-300 μm |
| Silicon Carbide (SiC) Micron Powder | NK0253 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 180-250 μm |
| Silicon Carbide (SiC) Micron Powder | NK0254 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 150-212 μm |
| Silicon Carbide (SiC) Micron Powder | NK0255 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 125-180 μm |
| Silicon Carbide (SiC) Micron Powder | NK0256 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 106-150 μm |
| Silicon Carbide (SiC) Micron Powder | NK0257 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 90-125 μm |
| Silicon Carbide (SiC) Micron Powder | NK0258 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 63-106 μm |
| Silicon Carbide (SiC) Micron Powder | NK0259 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 53-90 μm |
| Silicon Carbide (SiC) Micron Powder | NK0260 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 45-75 μm |
| Silicon Carbide (SiC) Micron Powder | NK0261 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 28-70 μm |
| Silicon Carbide (SiC) Micron Powder | NK0262 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 22-59 μm |
| Silicon Carbide (SiC) Micron Powder | NK0263 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99+%, Size: 16-49 µm |
| Silicon Carbide (SiC) Micron Powder | NK0264 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 12-40 μm |
| Silicon Carbide (SiC) Micron Powder | NK0265 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 8-32 μm |
| Silicon Carbide (SiC) Micron Powder | NK0266 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 5-25 μm |
| Silicon Carbide (SiC) Micron Powder | NK0267 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 3-19 μm |
| Silicon Carbide (SiC) Micron Powder | NK0268 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 2-14 μm |
| Manganese Ferrite Black Oxide Micron Powder | NK0269 | Genel Endüstriyel Kullanım | (Fe, Mn)3O4, 94+%, -325 mesh |
| Nickel Oxide (NiO) Micron Powder | NK0270 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh, Green |
| Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles | NK0271 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 25-50 nm |
| Nickel Oxide (NiO) Nanopowder/Nanoparticles | NK0272 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8-18 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0273 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 95.9+%, Size: 18-35 nm, KH570 Coated |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0274 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5+%, Size: < 90 nm |
| Antimony-Oxide-400-nm-99-.webp | NK0275 | Genel Endüstriyel Kullanım | |
| Antimony Oxide (Sb2O3) Nanopowder/Nanoparticles | NK0276 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 400 nm |
| Zirconium (II) Hydride (ZrH2) Micron Powder | NK0277 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: <10 µm |
| Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion | NK0278 | Genel Endüstriyel Kullanım | Size: 25-45 nm, 22 wt% |
| Nickel Oxide (NiO) Nanopowder/Nanoparticles | NK0279 | Genel Endüstriyel Kullanım | High Purity: 99.55+%, Size: 10-40 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0280 | Genel Endüstriyel Kullanım | Amorphous, Size: 45 nm, Al2O3: 92 wt%, H2O: 6-7 wt% |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0281 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5+%, Size: 18 nm |
| Hafnium Oxide (HfO2) Nanopowder/Nanoparticles | NK0282 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 55-75 nm |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0283 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5+%, Size: 35 nm |
| Tungsten Carbide (WC) Nanopowder/Nanoparticles | NK0284 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 55 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0285 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 96.3+%, Size: 18-35 nm, KH550 Coated |
| Barium Titanate (BaTiO3) Micron Powder | NK0286 | Genel Endüstriyel Kullanım | Purity: > 99 %, Size: 1-3 µm |
| Hafnium Oxide (HfO2) Micron Powder | NK0287 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1 µm |
| Silver (Ag) Doped Antibacterial Nanopowder/Nanoparticles | NK0288 | Genel Endüstriyel Kullanım | Size: 100 nm |
| Hydroxyapatite Nanopowder/Nanoparticles | NK0289 | Genel Endüstriyel Kullanım | Needle Type, Purity: 96%, Size: 200 nm |
| Zinc Ferrite (ZnFe2O4) Micron Powder | NK0290 | Genel Endüstriyel Kullanım | Zinc Iron Oxide Micron Powder, -325 mesh, 99.9% |
| Iron (Fe) Micron Powder | NK0291 | Genel Endüstriyel Kullanım | Purity: 99%, Size: 100 mesh |
| Silver (Ag) Nanopowder/Nanoparticles Dispersion | NK0292 | Genel Endüstriyel Kullanım | Purity: %99.99, Size: 20-30 nm, 167 ppm |
| Activated Carbon & Carbon Nanotube Mixed | NK0293 | Genel Endüstriyel Kullanım | |
| Short Length Multi Walled Carbon Nanotubes | NK0294 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| Molybdenum (Mo) Micron Powder | NK0295 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 20 µm |
| Titanium Silicon Carbide (Ti3SiC2) Micron Powder | NK0296 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: < 325 mesh |
| Aligned Multi Walled Carbon Nanotubes | NK0297 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm, Length 9-14 µm |
| C-NERGY Super P Conductive Carbon Black | NK0298 | Genel Endüstriyel Kullanım | 1 bag: 40 g |
| Titanium Diboride (TiB2) Micron Powder | NK0299 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 98.5+%, Size: 2.5-13 μm |
| Zinc Oxide (ZnO) Nanopowder Dispersion in Ethanol | NK0300 | Genel Endüstriyel Kullanım | Size: 20-30nm, 20wt% |
| Magnesium Oxide (MgO) Micron Powder | NK0301 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.99 %, Size: 500 nm – 1500nm |
| Silver (Ag) Nanopowder/Nanoparticles | NK0302 | Genel Endüstriyel Kullanım | Purity: 99.95% , Size: 45-75 nm, w/~0.25% PVP |
| Silicon Carbide (SiC) Nanopowder/Nanoparticles | NK0303 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: 790 nm |
| Silica (SiO2) Micron Powder | NK0304 | Genel Endüstriyel Kullanım | Spherical, APS: 0.3um, SiO2 Content:99.5+% |
| Terbium Oxide (Tb4O7) Micron Powder | NK0305 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Lithium Fluoride Powder | NK0306 | Genel Endüstriyel Kullanım | Size: <100 μm, Purity: 99.95 % |
| Yttrium (Y) Micron Powder | NK0307 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Cerium Oxide (CeO2) Micron Powder | NK0308 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh, White |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0309 | Genel Endüstriyel Kullanım | Alpha, High Purity: 99.95%, Size: 180 nm, Hydrophilic |
| C-NERGY SUPER C45 Conductive Carbon Black (set: 80 g) | NK0310 | Genel Endüstriyel Kullanım | |
| KETJENBLACK EC-300J Conductive Carbon Black | NK0311 | Genel Endüstriyel Kullanım | |
| Silicon (Si) Micron Powder | NK0312 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99 %, Size: 100 mesh |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0313 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| Holmium Oxide (Ho2O3) Micron Powder | NK0314 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Multi Walled Carbon Nanotubes | NK0315 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0316 | Genel Endüstriyel Kullanım | Alpha/Gamma, Size: 48 nm, 85% Alpha, 15% Gamma |
| Cobalt (Co) Micron Powder | NK0317 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1 µm |
| Tungsten Disulfide (WS2) Micron Powder | NK0318 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1 µm |
| Lanthanum (La) Micron Powder | NK0319 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Titanium Aluminum Carbide (Ti2AlC) Micron Powder | NK0320 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9+%, Size: 50 µm |
| Aluminum Nitride (AlN) Nanopowder/Nanoparticles | NK0321 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 60-70 nm, Hexagonal |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0322 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 18 nm, Partially Passivated |
| Hydroxyapatite Nanopowder/Nanoparticles | NK0323 | Genel Endüstriyel Kullanım | Purity: 95% min, Size: 50 nm |
| Antimony Tin Oxide (ATO) Nanopowder/Nanoparticles | NK0324 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 20-50 nm |
| Tungsten (W) Nanopowder/Nanoparticles | NK0325 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 780 nm, metal basis |
| Chromium (Cr) Micron Powder | NK0326 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 15-60 µm, Spherical |
| Tungsten Carbide Cobalt (WC/Co) Nanopowder/Nanoparticles | NK0327 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 35-75 nm |
| Nanoclay | NK0328 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 800 nm |
| Boron Nitride (BN) Nanopowder/Nanoparticles | NK0329 | Genel Endüstriyel Kullanım | Purity: 99.7%, Size: 790 nm, Hexagonal |
| Aluminum Oxide (Al2O3) Micron Powder | NK0330 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1-10 μm |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0331 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 45 nm, Cubic |
| Gadolinium Oxide (Gd2O3) Nanopowder/Nanoparticles | NK0332 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 13-95 nm |
| Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion | NK0333 | Genel Endüstriyel Kullanım | Size: 40-50 nm, 22 wt% |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0334 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Neodymium Oxide (Nd2O3) Nanopowder/Nanoparticles | NK0335 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 25-40 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0336 | Genel Endüstriyel Kullanım | Gamma, Purity: 99.995%, Size: 4 nm, Hydrophilic |
| P25 Titanium Dioxide Nanopowder (TiO2) Purity 99.5+ % Size 20 nm | NK0337 | Seramik, Yarı İletken, Kimyasal Endüstri | |
| Lanthanum Oxide (La2O3) Nanopowder/Nanoparticles | NK0338 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: < 180 nm |
| Erbium Oxide (Er2O3) Nanopowder/Nanoparticles | NK0339 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8-90 nm, Cubic |
| Spherical Nickel Base Alloy Micron Powder | NK0340 | Genel Endüstriyel Kullanım | Inconel 625 Powder, Size: 50-150 µm |
| Spherical Nickel Base Alloy Micron Powder | NK0341 | Genel Endüstriyel Kullanım | Inconel 718 Powder, Size: 50-150 µm |
| Manganese Dioxide (MnO2) Micron Powder | NK0342 | Genel Endüstriyel Kullanım | Purity: 99 %, Size: 200 mesh |
| Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles | NK0343 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: 30 nm |
| Titanium Nitride (TiN) Nanopowder/Nanoparticles | NK0344 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.2+%, Size: 20 nm, Cubic |
| Titanium Carbide (TiC) Nanopowder/Nanoparticles | NK0345 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 35-55 nm, Cubic |
| Tantalum Carbide (TaC) Nanopowder/Nanoparticles | NK0346 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 950 nm, Cubic |
| Molybdenum Oxide (MoO3) Nanopowder/Nanoparticles | NK0347 | Genel Endüstriyel Kullanım | High Purity: 99.96+%, Size: 8-75 nm |
| CR2025 Coin Cell Cases (Positive and Negative Cases) | NK0348 | Genel Endüstriyel Kullanım | Materials: 304SS |
| Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles | NK0349 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8-28 nm |
| Chromium Oxide (Cr2O3) Nanopowder/Nanoparticles | NK0350 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 55 nm, Hexagonal |
| Nickel (II) Hydroxide (Ni(OH)2) Nanopowder/Nanoparticles | NK0351 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 18 nm, Beta |
| Selenium Dioxide (SeO2) Micron Powder | NK0352 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Graphene Water Dispersion | NK0353 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Black Liquid, Graphene: 0.5 wt% |
| Zinc Oxide (ZnO) Nanopowder/Nanoparticles Water Dispersion | NK0354 | Genel Endüstriyel Kullanım | Size: 25-35 nm, 22 wt% |
| Boron Carbide (B4C) Nanopowder/Nanoparticles | NK0355 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 40-60 nm, Hexagonal |
| Titanium (Ti) Micron Powder | NK0356 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 200 mesh |
| Silicon Carbide (SiC) Nanopowder/Nanoparticles | NK0357 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5%, Size: 20 nm, Laser Synthesized |
| Iron (Fe) Nanopowder/Nanoparticles | NK0358 | Genel Endüstriyel Kullanım | Purity: 99.55%, Size: 22 nm, Partially Passivated |
| Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles | NK0359 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 18-38 nm |
| Nitinol Shape Memory Alloy Wire | NK0360 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 2 mm, AF: 80-85°C |
| KETJENBLACK EC-600JD Conductive Carbon Black | NK0361 | Genel Endüstriyel Kullanım | |
| Strontium Titanate (SrTiO3) Nanopowder/Nanoparticles | NK0362 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 300-500 nm |
| Iron Oxide (Fe3O4) Nanopowder/Nanoparticles | NK0363 | Pigment, Manyetik Malzemeler, Katalizörler | High Purity: 99.55+%, Size: 14-29 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0364 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile:99.5+%, Size: 200 nm |
| Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles | NK0365 | Genel Endüstriyel Kullanım | Purity: 99.75%, Size: 48 nm |
| Dysprosium Oxide (Dy2O3) Nanopowder/Nanoparticles | NK0366 | Genel Endüstriyel Kullanım | High Purity: 99.95+%, Size: 28 nm |
| Iron Oxide (Fe2O3) Nanopowder/Nanoparticles | NK0367 | Pigment, Manyetik Malzemeler, Katalizörler | Alpha, High Purity: 99.6+%, Size: 28 nm |
| Iron Oxide (Fe2O3) Nanopowder/Nanoparticles | NK0368 | Pigment, Manyetik Malzemeler, Katalizörler | Gamma, High Purity: 99.55+%, Size: 18 nm |
| Multi Walled Carbon Nanotubes | NK0369 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| Polymer Dispersant for Dispersion of Carbon Nanotubes (CNTs) in Ester Solvents | NK0370 | Genel Endüstriyel Kullanım | |
| Tin Oxide (SnO2) Nanopowder/Nanoparticles | NK0371 | Genel Endüstriyel Kullanım | Purity: 99.97%, Size: 430 nm |
| 304 Stainless Steel Wave Spring (Belleville Washers) for CR2032 | NK0372 | Genel Endüstriyel Kullanım | Diameter: 15.4 mm, Thickness: 0.2 mm, Height: (1.2±0.03) mm |
| Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles | NK0373 | Genel Endüstriyel Kullanım | Purity: 99.77%, Size: 48 nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0374 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| (-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0375 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 10-30 nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0376 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| Carbon Nanotube (CNT) Nanoribbon Water Dispersion | NK0377 | Genel Endüstriyel Kullanım | 0.5 mg/mL |
| Spherical Nickel Base Alloy Micron Powder | NK0378 | Genel Endüstriyel Kullanım | Inconel 625 Powder, Size: 30-60 µm |
| Calcium Copper Titanate (CaCu3Ti4O12) Nano Powder | NK0379 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | D50: 360 nm, Purity: ≥ 99.5 % |
| Multi Walled Carbon Nanotubes Water Dispersion | NK0380 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 45-75 nm, Length: 8-18 µm |
| Multi Walled Carbon Nanotubes | NK0381 | Genel Endüstriyel Kullanım | Purity: > 95%, Outside Diameter: 30-50 nm |
| Zinc Oxide (ZnO) Nanopowder/Nanoparticles | NK0382 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 18 nm, KH550 |
| Multi Walled Carbon Nanotubes | NK0383 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0384 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 1”, Thickness: 0.125” |
| Lithium Carbonate (Battery Grade | NK0385 | Genel Endüstriyel Kullanım | Li2CO3) Purity ≥99.5% |
| Activated Carbon Micron Powder | NK0386 | Genel Endüstriyel Kullanım | Size: 200 Mesh |
| Spherical Nickel Base Alloy Micron Powder | NK0387 | Genel Endüstriyel Kullanım | Inconel 718 Powder, Size: 30-60 µm |
| Iron Nickel (Fe-Ni) Alloy Powder | NK0388 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh, Fe/Ni: 5:5 |
| Tin (Sn) Micron Powder | NK0389 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Graphene NMP Dispersion | NK0390 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 0.5 wt% |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol | NK0391 | Seramik, Yarı İletken, Kimyasal Endüstri | Size: 12 nm, Anatase, 22 wt % |
| Tungsten (W) Micron Powder | NK0392 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 2 µm |
| Spherical Nickel Base Alloy Micron Powder | NK0393 | Genel Endüstriyel Kullanım | Inconel 718 Powder, Size: 10-25 µm |
| Spherical Nickel Base Alloy Micron Powder | NK0394 | Genel Endüstriyel Kullanım | Inconel 625 Powder, Size: 15-45 µm |
| Tungsten Oxide (WO3) Micron Powder | NK0395 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3 µm |
| Lithium Manganese Oxide (LiMn2O4) Powder for Li-ion Battery Cathode Application | NK0396 | Genel Endüstriyel Kullanım | |
| Europium Oxide (Eu2O3) Nanopowder/Nanoparticles | NK0397 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 8-90 nm, Cubic |
| Lead (Pb) Micron Powder | NK0398 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Gadolinium Oxide (Gd2O3) Micron Powder | NK0399 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2-3 μm |
| Calcium Oxide (CaO) Nanopowder/Nanoparticles | NK0400 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95+%, Size: 10-70 nm |
| Nitinol Shape Memory Alloy Wire | NK0401 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 1 mm, AF: 15-20°C |
| Copper Oxide (CuO) Nanopowder/Nanoparticles | NK0402 | Genel Endüstriyel Kullanım | High Purity: 99.995%, Size: 15-45 nm |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0403 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Tantalum Carbide (TaC) Micron Powder | NK0404 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 3 µm |
| Type 316 Stainless Steel Powder | NK0405 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Nitinol Shape Memory Alloy Wire | NK0406 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 1 mm, AF: 45-50°C |
| Titanium Dioxide (TiO2) Micron Powder | NK0407 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+ %, Size: 1 µm, White, Rutile |
| Calcium Oxide (CaO) Micron Powder | NK0408 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9 %, Size: 1µm |
| Spherical Nickel Base Alloy Micron Powder | NK0409 | Genel Endüstriyel Kullanım | Inconel 718 Powder, Size: 15-45 µm |
| Boron Nitride (BN) Nanopowder/Nanoparticles | NK0410 | Genel Endüstriyel Kullanım | Purity: 99.85+%, Size: 65-75 nm, Hexagonal |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0411 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| Silicon (Si) Nanopowder/Nanoparticles | NK0412 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 97+%, Size: 45-65 nm, Oxygen Content: < 3% |
| Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles | NK0413 | Genel Endüstriyel Kullanım | High Purity: 99.55%, Size: 28-48 nm |
| Short Length Multi Walled Carbon Nanotubes | NK0414 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| Multi Walled Carbon Nanotubes | NK0415 | Genel Endüstriyel Kullanım | Purity: 92%, Outside Diameter: 8-10 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0416 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| Industrial Grade Multi Walled Carbon Nanotubes | NK0417 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 7-16 nm |
| Aqueous Suspension of Nanocrystalline Cellulose (NCC) | NK0418 | Genel Endüstriyel Kullanım | 6%wt |
| Highly Conductive Expanded Graphite Micron Powder | NK0419 | Genel Endüstriyel Kullanım | Purity: ≥ 96%, Size: 20 µm |
| Short Length Multi Walled Carbon Nanotubes | NK0420 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| Manganese Oxide (Mn2O3) Nanopowder/Nanoparticles | NK0421 | Genel Endüstriyel Kullanım | Purity: 99.4%, Size: 28 nm |
| Silicon (Si) Nanopowder/Nanoparticles | NK0422 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99+%, Size : < 70 nm, Laser Synthesized |
| Aluminum Sulfate Octadecahydrate (Al2H36O30S3) | NK0423 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Cadmium Selenide (CdSe) Nanopowder/Nanoparticles | NK0424 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: <100 nm |
| Graphite (C) Nanopowder/Nanoparticles | NK0425 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: < 50 nm |
| Boron (B) Nanopowder/Nanoparticles | NK0426 | Genel Endüstriyel Kullanım | APS:100 nm, Purity:99.55+% |
| Niobium Carbide (NbC) Micron Powder | NK0427 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1-3 µm |
| Silicon (Si) Nanopowder/Nanoparticles | NK0428 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 97+%, Size: 35-55 nm, Oxygen Content: < 3% |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Coated with Aluminic Ester | NK0429 | Genel Endüstriyel Kullanım | Alpha, Size: 55 nm, Super Hydrophobic, Al2O3: Aluminic Ester=98.1:1.2 |
| Double Walled Carbon Nanotubes | NK0430 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0431 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile Si Oil, Size: 25 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0432 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, High Purity: 99.5+ %, Size: 28 nm |
| Titanium Carbide (TiC) Nanopowder/Nanoparticles | NK0433 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 790 nm, Cubic |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0434 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 45 nm |
| Zirconium Carbide (ZrC) Nanopowder/Nanoparticles | NK0435 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 400-1100 nm, Cubic |
| Silicon Carbide (SiC) Micron Powder | NK0436 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: < 2, 6 µm, Whisker |
| Zinc Oxide (ZnO) Nanopowder/Nanoparticles | NK0437 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 18 nm |
| Nickel Tabs | NK0438 | Genel Endüstriyel Kullanım | Width: 3 mm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0439 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile Al, Si, Stearic Acid, Size: 25 nm |
| Indium Tin Oxide (ITO) Nanopowder/Nanoparticles | NK0440 | Genel Endüstriyel Kullanım | 90:10, Purity: 99.99%, Size: 18-65 nm |
| High Capacity and High Purity Graphite Micron Powder for Li-ion Battery | NK0441 | Genel Endüstriyel Kullanım | |
| Antimony (Sb) Micron Powder | NK0442 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 200 mesh |
| Manganese Sulfate Monohydrate (MnSO4.H2O) | NK0443 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Tungsten (W) Micron Powder | NK0444 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: Sub-Micron |
| Magnesium (Mg) Micron Powder | NK0445 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 35 µm, Metal Basis |
| Expandable Graphite | NK0446 | Genel Endüstriyel Kullanım | Purity: 95-97%, Size: 50 mesh |
| Tungsten (W) Micron Powder | NK0447 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 5 µm |
| Titanium (Ti) Micron Powder | NK0448 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+ %, Size: 100 mesh |
| Aluminum Oxide (Al2O3) Micron Powder | NK0449 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 200 mesh, Fused |
| Europium (Eu) Micron Powder | NK0450 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Zinc Oxide (ZnO) Nanopowder/Nanoparticles | NK0451 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 30-50 nm |
| Lithium hydroxide monohydrate (Trace Metals basis | NK0452 | Genel Endüstriyel Kullanım | LiOH.H2O), Purity: 99.995% |
| Molybdenum (Mo) Micron Powder | NK0453 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 10 µm |
| Molybdenum (Mo) Micron Powder | NK0454 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 325 mesh |
| Aligned Multi Walled Carbon Nanotubes | NK0455 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm, Length 25-95 µm |
| Bismuth Oxide (Bi2O3) Micron Powder | NK0456 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-5 µm |
| Carbon Nanotubes Doped with 32 wt% Graphene Nanopowder/Nanoparticles | NK0457 | Elektronik, Batarya Elektrotları, Sensörler | |
| Carbon Black Powder | NK0458 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 4 µm |
| Bismuth Oxide (Bi2O3) Micron Powder | NK0459 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 10 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0460 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1-2 µm, Fused |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0461 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Purity: 99.5+ %, Size: 20-30 nm |
| Graphene Oxide Dispersion | NK0462 | Elektronik, Batarya Elektrotları, Sensörler | 8 mg/mL, in H2O |
| Nitinol Shape Memory Alloy Wire | NK0463 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 0, 5 mm, AF: -10 – -15°C |
| Cobalt Iron Oxide (CoFe2O4) Nanopowder/Nanoparticles | NK0464 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.5+%, Size: 30 nm |
| Industrial Grade Multi Walled Carbon Nanotubes | NK0465 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 8-28 nm |
| 304SS Coin Cell Conical Spring for CR2032 | NK0466 | Genel Endüstriyel Kullanım | Diameter: 15.4 mm, Height: 1.1 mm, Thickness: 0.25 mm |
| Manganese (II) Carbonate (MnCO3) Nanopowder/Nanoparticles | NK0467 | Genel Endüstriyel Kullanım | Purity: 99.5+ %, Size: 50 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0468 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0469 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Tungsten (W) Micron Powder | NK0470 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 10 µm |
| Conductive Graphite Powder for Lithium Battery | NK0471 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1-5 µm |
| Cellulose Nanocrystal (Nanocrystalline Cellulose | NK0472 | Genel Endüstriyel Kullanım | CNC) |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0473 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| CNTs-High Impact Polystyrene Resin Matrix | NK0474 | Genel Endüstriyel Kullanım | CNTs: 22 wt%, HIPS: 78 wt% |
| Expandable Graphite | NK0475 | Genel Endüstriyel Kullanım | Purity: 99-99.5%, Size: 50 mesh |
| Aluminum Oxide (Al2O3) Micron Powder | NK0476 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 325 mesh, Fused |
| Carbon Black & Carbon Nanotube Mixed | NK0477 | Genel Endüstriyel Kullanım | Purity: >97.5% |
| Short Length Multi Walled Carbon Nanotubes | NK0478 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| Carbon Nanotubes-based Conductive Additives for Lithium Ion Battery | NK0479 | Genel Endüstriyel Kullanım | |
| Indium Tin Oxide (ITO) Nanopowder/Nanoparticles | NK0480 | Genel Endüstriyel Kullanım | 95:5, Purity: 99.97+%, Size: 18-73 nm |
| Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles | NK0481 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99+%, Size: 10-70 nm |
| Chromium Carbide (Cr3C2) Nanopowder/Nanoparticles | NK0482 | Genel Endüstriyel Kullanım | Purity: 99.75+%, Size: 25-125 nm |
| Zinc Cobalt Iron Oxide (Zn0.5Co0.5Fe2O4) Nanopowder/Nanoparticles | NK0483 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.995%, Size: 38 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0484 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Size: 28 nm, 26 wt% |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol | NK0485 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 22 nm, Amorphous, 15 wt% |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in 1 | NK0486 | Elektronik, Yarı İletkenler, Optik Malzemeler | 2-Propanediol, Size: 22 nm, Amorphous, 15 wt% |
| Graphitized Multi Walled Carbon Nanotubes | NK0487 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 28-48 nm |
| Cuprous Oxide (Cu2O) Micron Powder | NK0488 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1 µm |
| Boron (B) Micron Powder | NK0489 | Genel Endüstriyel Kullanım | Purity: 99 %, Size: 10 µm, Amorphous |
| Carbon Nanotube (CNT) Nanoribbon Water Dispersion | NK0490 | Genel Endüstriyel Kullanım | 1 mg/mL |
| Manganese (Mn) Micron Powder | NK0491 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Short Length Multi Walled Carbon Nanotubes | NK0492 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Copper (Cu) Nanopowder/Nanoparticles | NK0493 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 570 nm, Metal Basis |
| Copper (Cu) Nanowire | NK0494 | Genel Endüstriyel Kullanım | Purity: 99.55%, in Ethanol |
| Tungsten Disulfide (WS2) Nanopowder/Nanoparticles | NK0495 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 35-75 nm |
| Copper (Cu) Nanopowder/Nanoparticles | NK0496 | Genel Endüstriyel Kullanım | Purity: 99.85%, Size: 22 nm, Partially Passivated |
| Zirconium Carbide (ZrC) Nanopowder/Nanoparticles | NK0497 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Thickness: 18 nm, Cubic |
| Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles | NK0498 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.55%, Size: 8 nm |
| Nickel Tab with Adhesive Polymer Tape as Negative Terminal for Pouch Cell | NK0499 | Genel Endüstriyel Kullanım | Width: 4 mm |
| Silver (Ag) Nanopowder/Nanoparticles Dispersion | NK0500 | Genel Endüstriyel Kullanım | Purity: %99.99, Size: 3 nm, 2200 ppm |
| Zirconium Hydride (ZrH4) Nanopowder/Nanoparticles | NK0501 | Genel Endüstriyel Kullanım | Purity: 99.5+ %, Size: 20-40 nm |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0502 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0503 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 1”, Thickness: 0.250” |
| C-NERGY SUPER C65 Conductive Carbon Black | NK0504 | Genel Endüstriyel Kullanım | |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0505 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 790 nm, Metal Basis |
| Carbon Titanium Nitride (TiNC) Micron Powder | NK0506 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.95%, Size: 1.05-3.05 μm |
| Zirconia-Yttria Nanopowder/Nanoparticles | NK0507 | Genel Endüstriyel Kullanım | ZrO2-8Y, Purity: 99.95%, Size: 30 nm |
| Triton X-100 | NK0508 | Genel Endüstriyel Kullanım | |
| Iron (Fe) Nanopowder/Nanoparticles | NK0509 | Genel Endüstriyel Kullanım | Purity: 99.55%, Size: 22 nm, Carbon Coated |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0510 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size:18 nm, Carbon Coated |
| Silicon Carbide (SiC) Micron Powder | NK0511 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 98+%, Size: 1-10 μm |
| Graphite Sheet Thermal Interface Material | NK0512 | Genel Endüstriyel Kullanım | EYG Series, 1350 W/m.K, Thickness: 40 µm, Lenght: 115 mm, Width: 90 mm |
| PTFE Inside Chamber for Hydrothermal Synthesis Autoclave Reactors | NK0513 | Genel Endüstriyel Kullanım | Volume:50, 100, 500 ml |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water | NK0514 | Genel Endüstriyel Kullanım | Gamma, Size: 8 nm, 22 wt% |
| 304SS Coin Cell Battery Spacer | NK0515 | Genel Endüstriyel Kullanım | Diameter: 15.8 mm, Thickness: 0.5 mm |
| Polytetrafluoroethylene (PTFE) Condensed Liquid Binder for Li-ion Battery | NK0516 | Genel Endüstriyel Kullanım | |
| Molybdenum (Mo) Micron Powder | NK0517 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 3 µm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0518 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, High Purity: 99.5+ %, Size: 490 nm |
| Molybdenum Carbide (Mo2C) Micron Powder | NK0519 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2.6 µm, Hexagonal |
| Zinc Carbonate (ZnCO3) Nanopowder/Nanoparticles | NK0520 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 18 nm |
| Molybdenum (Mo) Micron Powder | NK0521 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 1 µm |
| 316 Stainless Steel Wave Spring (Belleville Washers) for CR2032 | NK0522 | Genel Endüstriyel Kullanım | Diameter: 15.8 mm, Thickness: 0.5 mm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0523 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase/Rutile, Purity: 99.5+%, Size: 18 nm |
| Cobalt Aluminate Blue Spinel Nanopowder CoAl2O4 Size: 300-500 nm | NK0524 | Genel Endüstriyel Kullanım | |
| Nickel Foam for Battery Applications Size: 200 mm x 300 mm x 0.5 mm | NK0525 | Genel Endüstriyel Kullanım | |
| Indium Hydroxide (In(OH)3) Nanopowder/Nanoparticles | NK0526 | Genel Endüstriyel Kullanım | High Purity: 99.996%, Size: 15-65 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0527 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Purity: 99.5+ %, Size: 17 nm |
| Graphite Sheet Thermal Interface Material | NK0528 | Genel Endüstriyel Kullanım | EYG Series, 1700 W/m.K, Thickness: 25 µm, Lenght: 180 mm, Width: 115 mm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in 1 | NK0529 | Seramik, Yarı İletken, Kimyasal Endüstri | 2-Propanediol, Size: 12 nm, Anatase, 22 wt% |
| Stellite 6 Spherical Micron Powder | NK0530 | Genel Endüstriyel Kullanım | Size : 15-45μm |
| Graphite Sheet Thermal Interface Material | NK0531 | Genel Endüstriyel Kullanım | EYG Series, 1600 W/m.K, Thickness: 25 µm, Lenght: 180 mm, Width: 115 mm |
| Graphitized Multi Walled Carbon Nanotubes | NK0532 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 48-78 nm |
| Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion | NK0533 | Genel Endüstriyel Kullanım | Size: 25-45 nm, 42 wt% |
| Graphitized Multi Walled Carbon Nanotubes | NK0534 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 18-28 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0535 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, High Purity: 99.5+ %, Size: 45 nm |
| Silicon Carbide (SiC) Micron Powder | NK0536 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: 1.5-35 µm, D50 |
| Erbium (Er) Micron Powder | NK0537 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Cerium Oxide (CeO2) Nanopowder/Nanoparticles | NK0538 | Genel Endüstriyel Kullanım | Purity: 99.975%, Size: 8-28 nm |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0539 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| (-OH) Functionalized Single Walled Carbon Nanotubes | NK0540 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Nickel Hydroxide Ni(OH)2 (NiOH-Co) Micron Powder | NK0541 | Genel Endüstriyel Kullanım | Size: 10-15 µm, Spherical |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles Ethanol Dispersion | NK0542 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Size: 45 nm, 22 wt% |
| Nitinol Shape Memory Alloy Wire | NK0543 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 1, 5 mm, AF: 35-40°C |
| Terbium (Tb) Micron Powder | NK0544 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0545 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| Carbon Nanotubes Doped with 52 wt% Boron Nitride (BN) Nanopowder/Nanoparticles | NK0546 | Genel Endüstriyel Kullanım | |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0547 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0548 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0549 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0550 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 8-18 nm |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0551 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 4-16 nm |
| Lithium Nickel Manganese Cobalt Oxide (LiNiCoMnO2) Powder for High Power Li-ion Battery Cathode Application | NK0552 | Genel Endüstriyel Kullanım | (Ni:Mn:Co=5:3:2) NMC 532 |
| Copper (Cu) Sputtering Targets | NK0553 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Copper (Cu) Nanopowder/Nanoparticles | NK0554 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 80-240 nm, Metal Basis |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0555 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Graphite Fluoride (Carbon Monofluoride) Micron Powder | NK0556 | Genel Endüstriyel Kullanım | 10-20 micron, F/C Ratio : 1.0 |
| Silicon Nitride (Si3N4) Nanopowder/Nanoparticles | NK0557 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.6%, Size: 760 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0558 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0559 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Nickel Cobalt Iron Oxide (Ni0.5Co0.5Fe2O4) Nanopowder/Nanoparticles | NK0560 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.995%, Size: 35 nm |
| Tin (Sn) Nanopowder/Nanoparticles | NK0561 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 50-70 nm, Metal Basis |
| Zinc (Zn) Nanopowder/Nanoparticles | NK0562 | Genel Endüstriyel Kullanım | High purity: 99.995+%, Size: 90-110 nm |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0563 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 18-28 nm |
| Spherical TC4 Titanium Based Micron Powder for 3d Printers | NK0564 | Seramik, Yarı İletken, Kimyasal Endüstri | Ti6Al4V, 50-150 µm, Spherical |
| Graphite Sheet Thermal Interface Material | NK0565 | Genel Endüstriyel Kullanım | EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 115 mm, Width: 90 mm |
| Spherical Nickel Base Alloy Micron Powder | NK0566 | Genel Endüstriyel Kullanım | Inconel 625 Powder, Size: 10-25 µm |
| Carbon Nanotubes Doped with 52 wt% Graphene Nanopowder/Nanoparticles | NK0567 | Elektronik, Batarya Elektrotları, Sensörler | |
| Aluminum (Al) Sputtering Targets | NK0568 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Zinc Manganese Iron Oxide (Zn0.5Mn0.5Fe2O4) Nanopowder/Nanoparticles | NK0569 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.995%, Size:28-58 nm |
| Carboxymethyl Cellulose (CMC) Micron Powder for Li-ion Battery Anode Materials | NK0570 | Genel Endüstriyel Kullanım | |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0571 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 48-78 nm |
| Carbon Nanotubes Thermal Radiation Coating Dispersion | NK0572 | Genel Endüstriyel Kullanım | |
| (-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes | NK0573 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 8-28 nm |
| High Temperature Polyimide Tape for Lithium Battery | NK0574 | Genel Endüstriyel Kullanım | Width: 10 mm |
| (-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0575 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 8-15 nm |
| (-OH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0576 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 48-78 nm |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0577 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| (-OH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0578 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 18-38 nm |
| Reduced Graphene Oxide (rGO) | NK0579 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99%, S.A: 15.62 m2/g, 2-5 layers |
| Graphene Ethanol Dispersion | NK0580 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 0.5 wt% |
| Tungsten Oxide (WO3) Nanopowder/Nanoparticles | NK0581 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 20-60 nm, Orthorhombic |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0582 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 65 nm, Metal Basis |
| Titanium Nitride (TiN) Nanopowder/Nanoparticles | NK0583 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.3+%, Size: 790 nm, Cubic |
| (-COOH) Functionalized Single Walled Carbon Nanotubes | NK0584 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Silicon Monoxide (SiO) Pellets | NK0585 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99%, Size: 1-3 mm |
| Erbium Oxide (Er2O3) Micron Powder | NK0586 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-10 µm |
| Zinc Titanate Micron Powder (ZnTiO3) Purity: 99+% | NK0587 | Genel Endüstriyel Kullanım | Size: 1-2 µm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0588 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, High Purity: 99.5+ %, Size: 10-20 nm |
| Conductive Carbon Black Nanopowder/Nanoparticles | NK0589 | Genel Endüstriyel Kullanım | Size: 30 nm |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0590 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 8-18 nm |
| Aluminum (Al) Micron Powder | NK0591 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0592 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Zirconium Diboride (ZrB2) Nanopowder/Nanoparticles | NK0593 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 45 nm, Hexagonal |
| Praseodymium Oxide (Pr6O11) Micron Powder | NK0594 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Carbon Aluminum Nitride (AlNC) Micron Powder | NK0595 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1-3 µm |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0596 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 28-48 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water | NK0597 | Genel Endüstriyel Kullanım | Gamma, Size: 28 nm, 22 wt% |
| Copper (Cu) Sputtering Targets | NK0598 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0599 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Size: 8-33 nm, 26 wt% |
| Zinc (Zn) Nanopowder/Nanoparticles | NK0600 | Genel Endüstriyel Kullanım | High purity: 99.9+%, Size: 60-70 nm |
| CR2025 Coin Cell Cases (Positive and Negative Cases) | NK0601 | Genel Endüstriyel Kullanım | Materials: 316SS |
| Spherical TC4 Titanium Based Micron Powder for 3d Printers | NK0602 | Seramik, Yarı İletken, Kimyasal Endüstri | Ti6Al4V, 25-50 µm, Spherical |
| Iron (II | NK0603 | Genel Endüstriyel Kullanım | III) Oxide (Fe3O4) Nanopowder/Nanoparticles Water Dispersion, Size: 13-18 nm, 22 wt% |
| Lithium Zirconate (Lithium Zirconium Oxide | NK0604 | Genel Endüstriyel Kullanım | Li2ZrO3), Purity: ≥99, Size: 1 -3 µm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0605 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: 25-45 nm, 42 wt% |
| 316SS Coin Cell Battery Spacer | NK0606 | Genel Endüstriyel Kullanım | Diameter: 15.8 mm, Thickness: 0.5 mm |
| Graphite Fluoride (Carbon Monofluoride) Micron Powder for Li-ion Battery | NK0607 | Genel Endüstriyel Kullanım | 10-20 micron, F/C Ratio : 0.8-1.0 |
| Thulium Oxide (Tm2O3) Micron Powder | NK0608 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in 1 | NK0609 | Genel Endüstriyel Kullanım | 2-Propanediol, Size: 12 nm, Gamma, 18 wt% |
| Lithium Iron Phosphate (LiFePO4) Powder for Li-ion Battery Cathode Application | NK0610 | Genel Endüstriyel Kullanım | |
| Indium Oxide (In2O3) Nanopowder/Nanoparticles | NK0611 | Genel Endüstriyel Kullanım | High Purity: 99.9%, Size: 18-68 nm |
| Cobalt (Co) Micron Powder | NK0612 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh |
| (-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0613 | Genel Endüstriyel Kullanım | Purity: > 90%, Outside Diameter: 50-80 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol | NK0614 | Genel Endüstriyel Kullanım | Size: 12 nm, Gamma, 18 wt% |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0615 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: 3-28 nm, 16 wt% |
| Silicon (Si) Micron Powder | NK0616 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99 %, Size: 1 µm |
| Short Single Walled Carbon Nanotubes | NK0617 | Genel Endüstriyel Kullanım | Purity: > 65%, SSA: 400 m2/g |
| Iron (Fe) Nanopowder/Nanoparticles | NK0618 | Genel Endüstriyel Kullanım | Purity: 99.55+%, Size: 60-70 nm, Metal Basis |
| Lanthanum Trifluoride (LaF3) Nanopowder/Nanoparticles | NK0619 | Genel Endüstriyel Kullanım | Highly Dispersible, Purity: 99+%, Size: 30-50 nm |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0620 | Genel Endüstriyel Kullanım | Purity: > 99%, Outside Diameter: 48-78 nm |
| Iron (Fe) Nanopowder/Nanoparticles | NK0621 | Genel Endüstriyel Kullanım | Purity: 99.55+%, Size: 90-100 nm, Metal Basis |
| Industrial Grade Multi Walled Carbon Nanotubes | NK0622 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 48-78 nm |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0623 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 4-16 nm |
| Silicon Nitride (Si3N4) Nanopowder/Nanoparticles | NK0624 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Purity: 99.5%, Size: 20-35 nm |
| Erbium Oxide (Er2O3) Micron Powder | NK0625 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Silicon Carbide (SiC) Nanopowder/Nanoparticles | NK0626 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: < 70 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0627 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, Size: 4-28 nm, 17 wt% |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0628 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, Size: 25-45 nm, 22 wt% |
| Cellulose Nanofiber (Cellulose Nanofibril | NK0629 | Genel Endüstriyel Kullanım | Nanofibrillated Cellulose, CNFs) |
| Conductive Carbon Black Nanopowder/Nanoparticles | NK0630 | Genel Endüstriyel Kullanım | Size: 20 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0631 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: ≤10nm |
| 316SS Coin Cell Conical Spring for CR2032 | NK0632 | Genel Endüstriyel Kullanım | Diameter: 15.4 mm, Height: 1.2 mm, Thickness: 0.25 mm |
| Aluminum (Al) Nanopowder/Nanoparticles | NK0633 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 110 nm, Metal Basis |
| Dysprosium Oxide (Dy2O3) Micron Powder | NK0634 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Neodymium Oxide (Nd2O3) Micron Powder | NK0635 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Manganese (II) Acetate Tetrahydrate (C4H16MnO8) | NK0636 | Genel Endüstriyel Kullanım | Purity: > 99% |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0637 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 18-28 nm |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0638 | Genel Endüstriyel Kullanım | Purity: > 99%, Outside Diameter: 28-48 nm |
| Ytterbium (Yb) Micron Powder | NK0639 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Aluminum (Al) Nanopowder/Nanoparticles | NK0640 | Genel Endüstriyel Kullanım | Purity: ≥99.9%, Size: 68 nm, Metal Basis |
| Silver (Ag) Nanopowder/Nanoparticles Dispersion | NK0641 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 14 nm, 1200 ppm |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0642 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 28-48 nm |
| Graphene Water Dispersion | NK0643 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Black Liquid, Graphene: 1, 0 wt% |
| Copper (Cu) Sputtering Targets | NK0644 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0645 | Genel Endüstriyel Kullanım | Purity: > 99.99 %, Outside Diameter: 48-78 nm |
| Lithium Nickel Manganese Oxide (LMNO) for Li-Ion Cathode Material | NK0646 | Genel Endüstriyel Kullanım | LiNi0.5Mn1.5O4 |
| Zirconium Nitride (ZrN) Micron Powder | NK0647 | Genel Endüstriyel Kullanım | Purity: 99.97%, Thickness: 3.5 μm, Cubic |
| Cadmium Sulfide (CdS) Nanopowder/Nanoparticles | NK0648 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 20 nm |
| Dummy CZ-Si Wafer | NK0649 | Genel Endüstriyel Kullanım | Size: 8”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 1000 (ohm.cm), 1-Side Polished, Thickness: 725 ± 50 μm |
| Cuprous Oxide (Cu2O) Nanopowder/Nanoparticles | NK0650 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 16 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0651 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, Size: 3-13 nm, 16 wt% |
| Aluminum Chloride Hexahydrate (AlCl3H12O6) | NK0652 | Genel Endüstriyel Kullanım | Purity: > 97% |
| Graphitized Multi Walled Carbon Nanotubes | NK0653 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 4-16 nm |
| Spherical TC4 Titanium Based Micron Powder for 3d Printers | NK0654 | Seramik, Yarı İletken, Kimyasal Endüstri | Ti6Al4V, 15-35 µm, Spherical |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Water Dispersion | NK0655 | Genel Endüstriyel Kullanım | Gamma, Size: 100-200 nm, 23wt% |
| Terbium Oxide (Tb4O7) Nanopowder/Nanoparticles | NK0656 | Genel Endüstriyel Kullanım | Purity: 99.97%, Size: 8-110 nm, Cubic |
| Conductive Acetylene Black for Li-ion Battery Anode/Cathode | NK0657 | Genel Endüstriyel Kullanım | |
| Praseodymium (Pr) Sputtering Targets | NK0658 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Praseodymium (Pr) Sputtering Targets | NK0659 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| ZK60 Magnesium Alloy Micron Powder | NK0660 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Size Range: 20-63 µm, Spherical |
| High Temperature Teflon Tape for Lithium Battery | NK0661 | Genel Endüstriyel Kullanım | Width: 19 mm, Thickness: 0.13 mm, Length: 10 m |
| Graphene NMP Dispersion | NK0662 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 1, 0 wt% |
| (-OH) Functionalized Double Walled Carbon Nanotubes | NK0663 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Graphene Ethanol Dispersion | NK0664 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 1 wt% |
| Silicon (Si) Sputtering Targets | NK0665 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Graphene Sheet | NK0666 | Elektronik, Batarya Elektrotları, Sensörler | Size: 29 cm x 29 cm, Thickness: 35 µm, Highly Conductive |
| Tungsten (W) Sputtering Targets | NK0667 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Manganese (Mn) Micron Powder | NK0668 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 100 mesh |
| Copper (Cu) Sputtering Targets | NK0669 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Lithium (Li) Foil Thickness:0.5 mm | NK0670 | Genel Endüstriyel Kullanım | Width: 50 mm, Length: 100 mm, Purity: 99.9% |
| Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles | NK0671 | Genel Endüstriyel Kullanım | Purity: 99.7+%, Size: 25 nm |
| Silver (Ag) Nanopowder/Nanoparticles Water Dispersion | NK0672 | Genel Endüstriyel Kullanım | Size: 2 nm, Colorless & Transparent, 2.200 ppm |
| Water.webp | NK0673 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 590-620 nm | NK0674 | Genel Endüstriyel Kullanım | |
| Boron (B) Micron Powder | NK0675 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 1-2 μm Amorphous |
| Silicon (Si) Sputtering Targets | NK0676 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK0677 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Titanium (Ti) Micron Powder | NK0678 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity:99.5+%, Size:75-150 µm, Spherical |
| G-QD.webp | NK0679 | Genel Endüstriyel Kullanım | |
| Graphene Quantum Dots (1mg/ml) (GQD) | NK0680 | Elektronik, Batarya Elektrotları, Sensörler | |
| Barium Iron Oxide (BaFe12O19) Nanopowder/Nanoparticles | NK0681 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.95%, Size: 55 nm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0682 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Hafnium Oxide (HfO2) Micron Powder | NK0683 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0684 | Genel Endüstriyel Kullanım | Purity: > 99%, Outside Diameter: 18-28 nm |
| (-COOH) Functionalized Industrial Short Multi Walled Carbon Nanotubes | NK0685 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 28-48 nm |
| Titanium Alloy Micron Powders | NK0686 | Seramik, Yarı İletken, Kimyasal Endüstri | CPTi, 50-150 µm, Spherical |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0687 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles | NK0688 | Genel Endüstriyel Kullanım | Size: < 80 nm |
| Carbon (C) (Graphite) Sputtering Targets | NK0689 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Short Length Multi Walled Carbon Nanotubes | NK0690 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Zirconium Diboride (ZrB2) Micron Powder | NK0691 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 5.5 μm, Hexagonal |
| Nickel (Ni) Micron Powder | NK0692 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 4 µm, Spherical |
| Copper (Cu) Sputtering Targets | NK0693 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK0694 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0695 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 2”, Thickness: 0.125” |
| Cadmium Sulfide (CdS) Nanopowder/Nanoparticles | NK0696 | Genel Endüstriyel Kullanım | Purity: 99.95+%, Size: 5 nm |
| Zinc (Zn) Sputtering Targets | NK0697 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| High Purity Natural Graphite Nanopowder/Nanoparticles for Li-ion Battery | NK0698 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 30 nm |
| Carbon Nanotube (CNT) Nanoribbon Water Dispersion | NK0699 | Genel Endüstriyel Kullanım | 2 mg/mL |
| Iron (Fe) Micron Powder | NK0700 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 5 µm |
| Spherical TC4 Titanium Based Micron Powder for 3d Printers | NK0701 | Seramik, Yarı İletken, Kimyasal Endüstri | Ti6Al4V, 10-25 µm, Spherical |
| Copper (Cu) Micron Powder | NK0702 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 1 µm, Spherical |
| Industrial Grade Short Multi Walled Carbon Nanotubes | NK0703 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 28-48 nm |
| Titanium Alloy Micron Powders | NK0704 | Seramik, Yarı İletken, Kimyasal Endüstri | CPTi, 25-50 µm, Spherical |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0705 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: 25-45 nm, 16 wt% |
| Aluminum chloride (AlCl3) Purity: > 99% | NK0706 | Genel Endüstriyel Kullanım | |
| Cuprous Oxide (Cu2O) Micron Powder | NK0707 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 3 µm |
| Vanadium Carbide (VC) Nanopowder/Nanoparticles | NK0708 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 550-750 nm, Cubic |
| Lead (Pb) Sputtering Targets | NK0709 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Multi Walled Carbon Nanotubes Water Dispersion | NK0710 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 18-28 nm, Length: 8-35 µm |
| Boron (B) Micron Powder | NK0711 | Genel Endüstriyel Kullanım | Purity: 95+ %, Size: -325 mesh, Amorphous |
| Lithium Nickel Manganese Cobalt Oxide (LiNiMnCoC) Powder (NMC 622) | NK0712 | Genel Endüstriyel Kullanım | |
| Lithium Nickel Manganese Cobalt Oxide Powder (NMC 811) | NK0713 | Genel Endüstriyel Kullanım | |
| Nickel (Ni) Sputtering Targets | NK0714 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Aluminum Foam for Battery and Supercapacitor Research | NK0715 | Genel Endüstriyel Kullanım | Purity: 99+%, Size : 100 mm x100 mm x 4mm |
| Titanium Alloy Micron Powders | NK0716 | Seramik, Yarı İletken, Kimyasal Endüstri | CPTi, 15-35 µm, Spherical |
| Lithium Nickel Manganese Cobalt Oxide (LiNiMnCoC) Powder (NMC 111) | NK0717 | Genel Endüstriyel Kullanım | |
| Nickel (III) Oxide (Ni2O3) Nanopowder/Nanoparticles | NK0718 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: 40 nm |
| (-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes | NK0719 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 28-48 nm |
| Tungsten (W) Micron Powder | NK0720 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 325 mesh |
| Highly Conductive Expanded Graphite Micron Powder | NK0721 | Genel Endüstriyel Kullanım | Purity: ≥ 96%, Size: 70 µm |
| Graphitized Multi Walled Carbon Nanotubes | NK0722 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 8-18 nm |
| Manganese (II) Chloride (MnCl₂) | NK0723 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Zinc (Zn) Sputtering Targets | NK0724 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Helical Multi Walled Carbon Nanotubes | NK0725 | Genel Endüstriyel Kullanım | Outside Diameter: 75-175 nm, Length: 2-15 µm |
| Iron (Fe) Sputtering Targets | NK0726 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0727 | Genel Endüstriyel Kullanım | Purity: > 99%, Outside Diameter: 4-16 nm |
| Tungsten (W) Nanopowder/Nanoparticles | NK0728 | Genel Endüstriyel Kullanım | Purity: 99.955+%, Size: 65 nm, Metal Basis |
| Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion | NK0729 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96 %, OD: 18-28 nm, Length 8-18 µm |
| Iron (III) Chloride (FeCl3) | NK0730 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Carbon Nanotubes Metal Tapes with Iron (Fe) 14 wt% | NK0731 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Copper (Cu) Nanopowder/Nanoparticles | NK0732 | Genel Endüstriyel Kullanım | Purity: 99.85%, Size: 22 nm, Carbon Coated |
| Copper (Cu) Sputtering Targets | NK0733 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK0734 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Graphene Oxide | NK0735 | Elektronik, Batarya Elektrotları, Sensörler | 2-5 Layer, Dia: 4, 5 µm, SA: 420 m2/gr |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0736 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Copper Oxide (CuO) Nanopowder/Nanoparticles Water Dispersion | NK0737 | Genel Endüstriyel Kullanım | Size: 20-50 nm, 22 wt% |
| Zinc Sulfide (ZnS) Pellets | NK0738 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-10 mm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0739 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: 3-12 nm, 16 wt% |
| (-OH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0740 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 7-16 nm |
| Graphitic Carbon Nitride (g-C3N4) Powder 1-10 μm | NK0741 | Genel Endüstriyel Kullanım | |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0742 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 3” , Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0743 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotube-Mica Prepared by Electrostatic Adsorption | NK0744 | Genel Endüstriyel Kullanım | CNTs: 15 wt%; Mica: 85 wt% |
| Cobalt (Co) Sputtering Targets | NK0745 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Silver Tin (Ag-Sn) Alloy Nanopowder/Nanoparticles | NK0746 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size : < 110 nm |
| Carbon Nanotube-TiO2 Prepared by Electrostatic Adsorption | NK0747 | Genel Endüstriyel Kullanım | CNTs: 15 wt%, TiO2-rutile: 85 wt% |
| Copper Foam for Battery and Supercapacitor Research | NK0748 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size : 100 mm x100 mm x 1mm |
| Cobalt (Co) Micron Powder | NK0749 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 100 mesh |
| Graphene Ethanol Dispersion | NK0750 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 2 wt% |
| Cobalt Titanate Green Spinel Nanopowder ( Co2TiO4) | NK0751 | Genel Endüstriyel Kullanım | |
| Titanium Oxynitride Nanoparticle | NK0752 | Seramik, Yarı İletken, Kimyasal Endüstri | APS: 20 nm, Purity: 99.9% |
| Europium Oxide (Eu2O3) Micron Powder | NK0753 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Lithium Nickel Cobalt Aluminum Oxide (NCA) (LiNi0.8Co0.15Al0.05O2) Powder for High Power Li-ion Battery Cathode Application | NK0754 | Genel Endüstriyel Kullanım | |
| Silicon Carbide (SiC) Nanopowder/Nanoparticles | NK0755 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: 50-70 nm |
| Silver Copper (Ag-Cu) Alloy Nanopowder/Nanoparticles | NK0756 | Genel Endüstriyel Kullanım | Purity: 99.95% , Size: < 110 nm |
| Tungsten Carbide (WC) Nanopowder/Nanoparticles | NK0757 | Genel Endüstriyel Kullanım | Purity: 99.96%, Size: 25-95 nm |
| Iron Foam for Battery and Supercapacitor Research | NK0758 | Genel Endüstriyel Kullanım | Purity:98%, Size:300*200mm, Thickness: 2mm |
| PVDF Binder for Li-ion Battery Electrodes (set: 80g ) | NK0759 | Genel Endüstriyel Kullanım | |
| Zinc (Zn) Micron Powder | NK0760 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 10 µm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0761 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Lead Oxide (PbO) Micron Powder | NK0762 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh, Yellow |
| Multi Walled Carbon Nanotubes Water Dispersion | NK0763 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 3-13 nm, Length: 45 µm |
| Graphite Sheet Thermal Interface Material | NK0764 | Genel Endüstriyel Kullanım | EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 180 mm, Width: 115 mm |
| Titanium Alloy Micron Powders | NK0765 | Seramik, Yarı İletken, Kimyasal Endüstri | CPTi, 10-25 µm, Spherical |
| Tungsten Oxide (WO3) Micron Powder | NK0766 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Carbon Nanotubes Doped with 52 wt% Copper (Cu) Nanopowder/Nanoparticles | NK0767 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 52 wt% Tin (Sn) Nanopowder/Nanoparticles | NK0768 | Genel Endüstriyel Kullanım | |
| Titanium Aluminum Carbide (Ti2AlC) MAX Phase Micron Powder | NK0769 | Seramik, Yarı İletken, Kimyasal Endüstri | APS: 325 Mesh, Purity: 99+ % |
| Titanium (Ti) Micron Powder | NK0770 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity:99.5+%, Size:15-53 µm, Spherical |
| Super Conductive Carbon Black Nanopowder and Carbon Nanotube Mixed | NK0771 | Genel Endüstriyel Kullanım | |
| Aluminum (Al) Sputtering Targets | NK0772 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK0773 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Graphitized Carbon Nanofiber | NK0774 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 200-600 nm |
| Cesium Tungsten Oxide (Cs0.33WO3) Nanopowder/Nanoparticles | NK0775 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 18 nm |
| Aluminum (Al) Sputtering Targets | NK0776 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Cuprous Oxide (Cu2O) Nanopowder/Nanoparticles | NK0777 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 80 nm |
| Tantalum Pentoxide (Ta2O5) Micron Powder | NK0778 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 3 µm, White |
| Titanium (Ti) Micron Powder | NK0779 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity:99.5+%, Size:5-25 µm, Spherical |
| SS316 Coin Cell Battery Spacer | NK0780 | Genel Endüstriyel Kullanım | Diameter: 15.8mm, Thickness: 1mm |
| Iron (Fe) Sputtering Targets | NK0781 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 52 wt% Silica (SiO2) Nanopowder/Nanoparticles | NK0782 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 52 wt% Iron Oxide (Fe3O4) Nanopowder/Nanoparticles | NK0783 | Pigment, Manyetik Malzemeler, Katalizörler | |
| Carbon Nanotubes Doped with 52 wt% Zinc (Zn) Nanopowder/Nanoparticles | NK0784 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 52 wt% Titanium (Ti) Nanopowder/Nanoparticles | NK0785 | Seramik, Yarı İletken, Kimyasal Endüstri | |
| Carbon Nanotubes Doped with 52 wt% Cobalt (Co) Nanopowder/Nanoparticles | NK0786 | Genel Endüstriyel Kullanım | |
| Gold (Au) Nanopowder/Nanoparticles Dispersion | NK0787 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 20-30 nm, 172 ppm |
| Zinc (Zn) Sputtering Targets | NK0788 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK0789 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK0790 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Chromium Nitride (CrN) Micron Powder | NK0791 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-3 µm |
| Tantalum (Ta) Micron Powder | NK0792 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Cobalt Oxide (CoO) Micron Powder | NK0793 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Graphite Sheet Thermal Interface Material | NK0794 | Genel Endüstriyel Kullanım | EYG Series, 1600 W/m.K, Thickness: 25 µm, Lenght: 230 mm, Width: 180 mm |
| Boron (B) Micron Powder | NK0795 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: < 1 µm, Amorphous |
| (-COOH) Functionalized Short Single Walled Carbon Nanotubes | NK0796 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Tungsten Titanium (TiW) Sputtering Targets | NK0797 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Niobium (Nb) Sputtering Targets | NK0798 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.250” |
| Carbon (C) (Graphite) Sputtering Targets | NK0799 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Single Walled Carbon Nanotubes | NK0800 | Genel Endüstriyel Kullanım | Purity: > 92%, OD: 1-2 nm |
| Nickel Oxide (NiO) Nanopowder/Nanoparticles | NK0801 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 18 nm, Cubic |
| Tungsten Titanium (TiW) Sputtering Targets | NK0802 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Dispersion in PGMEA or PGME | NK0803 | Seramik, Yarı İletken, Kimyasal Endüstri | Size: 1 µm, Rutile, 20 wt% |
| Carbon Nanotubes Doped with 52 wt% Alumina (Al2O3) Nanopowder/Nanoparticles | NK0804 | Genel Endüstriyel Kullanım | |
| Cobalt (Co) Sputtering Targets | NK0805 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0806 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile: 90 wt%, CNTs: 8 wt% |
| Lithium (Li) Foil Thickness:0.6 mm | NK0807 | Genel Endüstriyel Kullanım | Width: 25 mm, Length: 100 mm, Purity: 99.9% |
| Carbon Nanotubes Doped with 52 wt% Aluminum (Al) Nanopowder/Nanoparticles | NK0808 | Genel Endüstriyel Kullanım | |
| Silicon (Si) Sputtering Targets | NK0809 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Titanium Aluminum Carbide (Ti3AlC2) MAX Phase Micron Powder | NK0810 | Seramik, Yarı İletken, Kimyasal Endüstri | APS: 325 Mesh, Purity: 99+ % |
| Tin (Sn) Sputtering Targets | NK0811 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Nitrogen-doped Multi Walled Carbon Nanotubes | NK0812 | Genel Endüstriyel Kullanım | |
| Nickel Chromium (Ni-Cr) Alloy Nanopowder/Nanoparticles | NK0813 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: < 90 nm |
| Zinc (Zn) Sputtering Targets | NK0814 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0815 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Graphene Water Dispersion | NK0816 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Black Liquid, Graphene: 2 wt% |
| Iron (Fe) Sputtering Targets | NK0817 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Hexaboride (LaB6) Micron Powder | NK0818 | Genel Endüstriyel Kullanım | High Purity: 99.95+%, Size: 200 mesh |
| Tantalum (Ta) Micron Powder | NK0819 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 100 mesh |
| Nickel (Ni) Micron Powder Type 255 | NK0820 | Genel Endüstriyel Kullanım | Purity: >99.7 %, APS: 2.2–2.8 μm |
| Carbon Nanotubes Doped with 12 wt% Iron (Fe) Nanopowder/Nanoparticles | NK0821 | Genel Endüstriyel Kullanım | |
| Beryllium (Be) Micron Powder | NK0822 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: -100 mesh |
| Magnesium Nitride (Mg3N2) Micron Powder | NK0823 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 35 µm |
| Tin Oxide (SnO2) Nanopowder/Nanoparticles | NK0824 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 18 nm |
| Hafnium Carbide (HfC) Nanopowder/Nanoparticles | NK0825 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 790 nm, Cubic |
| Aluminum (Al) Sputtering Targets | NK0826 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 32 wt% Silicon (Si) Nanopowder/Nanoparticles | NK0827 | Elektronik, Yarı İletkenler, Optik Malzemeler | |
| Carbon Nanotubes Doped with 32 wt% Copper (Cu) Nanopowder/Nanoparticles | NK0828 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 32 wt% Iron (Fe) Nanopowder/Nanoparticles | NK0829 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 12 wt% Copper (Cu) Nanopowder/Nanoparticles | NK0830 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 52 wt% Silicon (Si) Nanopowder/Nanoparticles | NK0831 | Elektronik, Yarı İletkenler, Optik Malzemeler | |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0832 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 2” , Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK0833 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Niobium (Nb) Micron Powder | NK0834 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 3 µm |
| Cadmium Selenide (CdSe) Micron Powder | NK0835 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1-10 µm |
| Carbon Nanotubes Doped with 52 wt% Iron (Fe) Nanopowder/Nanoparticles | NK0836 | Genel Endüstriyel Kullanım | |
| Niobium (Nb) Sputtering Targets | NK0837 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 32 wt% Silicon (Si) and 32 wt% Graphene Nanopowder/Nanoparticles | NK0838 | Elektronik, Batarya Elektrotları, Sensörler | |
| Carbon Nanotubes Doped with 12 wt% Aluminum (Al) Nanopowder/Nanoparticles | NK0839 | Genel Endüstriyel Kullanım | |
| Dysprosium (Dy) Micron Powder | NK0840 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Lead (Pb) Sputtering Targets | NK0841 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 1”, Thickness: 0.125” |
| Graphene NMP Dispersion | NK0842 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 2, 0 wt% |
| Carbon Nanotubes Doped with 32 wt% Aluminum (Al) Nanopowder/Nanoparticles | NK0843 | Genel Endüstriyel Kullanım | |
| Copper (Cu) Sputtering Targets | NK0844 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK0845 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK0846 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK0847 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK0848 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK0849 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0850 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 1”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK0851 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Aluminum Zirconium Alloy Powder | NK0852 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: < 44 µm, Al: 90%, Zr: 10% |
| Tungsten (W) Sputtering Targets | NK0853 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| SS304 Coin Cell Battery Spacer | NK0854 | Genel Endüstriyel Kullanım | Diameter: 15.8mm, Thickness: 1mm |
| Niobium (Nb) Sputtering Targets | NK0855 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.250” |
| Vanadium (V) Sputtering Targets | NK0856 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Silicon (Si) Nanopowder for Battery Applications | NK0857 | Elektronik, Yarı İletkenler, Optik Malzemeler | |
| Yttrium Oxyfluoride (YOF) Nanopowder | NK0858 | Genel Endüstriyel Kullanım | Purity: 99.9%, APS: < 50 nm |
| Selenium (Se) Sputtering Targets | NK0859 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Yttrium Fluoride (YF3) Nanopowder | NK0860 | Genel Endüstriyel Kullanım | Purity: 99.9%, APS: < 50 nm |
| Selenium (Se) Sputtering Targets | NK0861 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size:1”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK0862 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK0863 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| (-OH) Functionalized Single Walled Carbon Nanotubes | NK0864 | Genel Endüstriyel Kullanım | Purity: > 92%, SSA: 370 m2/g, Dia: 1.0 nm |
| (-COOH) Functionalized Single Walled Carbon Nanotubes | NK0865 | Genel Endüstriyel Kullanım | Purity: > 92%, SSA: 370 m2/g |
| Cobalt (Co) Sputtering Targets | NK0866 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| PPL Inside Chamber for Hydrothermal Synthesis Autoclave Reactors | NK0867 | Genel Endüstriyel Kullanım | |
| Zinc (Zn) Sputtering Targets | NK0868 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK0869 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Water-_21_.webp | NK0870 | Genel Endüstriyel Kullanım | |
| Diamond (C) Nanopowder/Nanoparticles | NK0871 | Genel Endüstriyel Kullanım | Purity: 99%, Size: 30-50 nm |
| Lanthanum Hexaboride (LaB6) Micron Powder | NK0872 | Genel Endüstriyel Kullanım | High Purity: 99.5+%, Size: 1.5-18 µm |
| Crystalline Boron (B) Micron Powder | NK0873 | Genel Endüstriyel Kullanım | Average Particle Size: -325 Mesh, Purity: 99+% |
| Aluminum 2024 Alloy Powder | NK0874 | Genel Endüstriyel Kullanım | Size: – 325 mesh |
| Aluminum 6061 Alloy Powder | NK0875 | Genel Endüstriyel Kullanım | Size: 15-53 µm, Spherical |
| N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials | NK0876 | Genel Endüstriyel Kullanım | Purity: 99.90% |
| Carbon Nanotube-Polystyrene Microspheres Prepared by Electrostatic Adsorption | NK0877 | Genel Endüstriyel Kullanım | CNTs: 25 wt%; Polystyrene Microspheres: 75 wt% |
| Niobium (Nb) Micron Powder | NK0878 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 325 mesh |
| Copper (Cu) Micron Powder | NK0879 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 100 mesh, Spherical |
| Hafnium (Hf) Micron Powder | NK0880 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| View Product | NK0881 | Genel Endüstriyel Kullanım | |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in 2-Propanol | NK0882 | Seramik, Yarı İletken, Kimyasal Endüstri | Size: 12 nm, Anatase, 22 wt% |
| Cobalt Chromium (Co-Cr) Alloy Powder | NK0883 | Genel Endüstriyel Kullanım | Size: < 44 µm, Co: 20%, Cr: 80% |
| Copper (Cu) Sputtering Targets | NK0884 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Ni-Ti50 Alloy Powder / Solid Spherical Micron Powder | NK0885 | Genel Endüstriyel Kullanım | Purity: 99.9%, APS: 45-105 μm |
| WE43 Magnesium Alloy Average Particle Size: 15-53 um | NK0886 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Spherical |
| Zirconium (Zr) Micron Powder | NK0887 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Crystalline Boron (B) Micron Powder | NK0888 | Genel Endüstriyel Kullanım | Average Particle Size: 5 µm, Purity: 99+% |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK0889 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Lithium Lanthanum Tantalum Zirconate (LLZTO) | NK0890 | Genel Endüstriyel Kullanım | Size: 1-3 µm, Purity: ≥99.5 |
| Graphite Sheet Thermal Interface Material | NK0891 | Genel Endüstriyel Kullanım | EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 230 mm, Width: 180 mm |
| Cobalt (Co) Sputtering Targets | NK0892 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK0893 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK0894 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Aluminum Silicon (AlSi) Sputtering Targets | NK0895 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0896 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 31 nm, Metal Basis |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0897 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 90 nm, Metal Basis |
| Praseodymium (Pr) Sputtering Targets | NK0898 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 52 wt% Silver (Ag) Nanopowder/Nanoparticles | NK0899 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 12 wt% Silver (Ag) Nanopowder/Nanoparticles | NK0900 | Genel Endüstriyel Kullanım | |
| Aluminum (Al) Sputtering Targets | NK0901 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0902 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 3”, Thickness: 0.125” |
| Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles | NK0903 | Genel Endüstriyel Kullanım | Purity: 99.9% , Size: < 500 nm |
| Aluminum Nitride (AlN) Nanopowder/Nanoparticles | NK0904 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 790 nm, Hexagonal |
| Molybdenum (Mo) Sputtering Targets | NK0905 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK0906 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK0907 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Carbon Nanotube-TiO2 Prepared by Electrostatic Adsorption | NK0908 | Genel Endüstriyel Kullanım | CNTs: 25 wt%, TiO2-rutile: 75 wt% |
| Zinc (Zn) Sputtering Targets | NK0909 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 32 wt% Silver (Ag) Nanopowder/Nanoparticles | NK0910 | Genel Endüstriyel Kullanım | |
| Molybdenum (Mo) Nanopowder/Nanoparticles | NK0911 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 50-150 nm, Metal Basis |
| Aluminum Silicon (AlSi) Sputtering Targets | NK0912 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0913 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK0914 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 1”, Thickness: 0.125” |
| Lead Zirconate Titanate (PZT) Nanopowder/Nanoparticles | NK0915 | Genel Endüstriyel Kullanım | Purity: 99.5+ %, Size: < 100 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0916 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 3”, Thickness: 0.250” |
| Crystalline Boron (B) Micron Powder | NK0917 | Genel Endüstriyel Kullanım | Average Particle Size: 1 µm, Purity: 99+% |
| Prime CZ-Si Wafer | NK0918 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 279 ± 20 μm |
| Scandium (Sc) Micron Powder | NK0919 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Particle Size: 200 mesh |
| Praseodymium (Pr) Sputtering Targets | NK0920 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK0921 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK0922 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK0923 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0924 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0925 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK0926 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK0927 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK0928 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK0929 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Vanadium Aluminum Carbide (V2AlC) MAX Phase Micron Powder | NK0930 | Genel Endüstriyel Kullanım | APS: 325 Mesh, Purity: 99+ % |
| Magnesium (Mg) Sputtering Targets | NK0931 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 1”, Thickness: 0.250” |
| Lead (Pb) Sputtering Targets | NK0932 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 1”, Thickness: 0.250” |
| Copper (Cu) Nanopowder/Nanoparticles | NK0933 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 65 nm, Metal Basis |
| Nickel (Ni) Sputtering Targets | NK0934 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0935 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Amino-Multi Walled Carbon Nanotubes | NK0936 | Genel Endüstriyel Kullanım | Purity: > 95 wt%, Length: 60 μm |
| Carbon Nanotube Sponges | NK0937 | Genel Endüstriyel Kullanım | Size: 10 mm x 10 mm, Thickness: 1-2 mm |
| Scandium (Sc) Micron Powder | NK0938 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Carbon Nanotubes Metal Films with Iron (Fe) 13 wt% | NK0939 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Diameter: 47 mm |
| Titanium Tin Carbide (Ti2SnC) MAX Phase Micron Powder | NK0940 | Seramik, Yarı İletken, Kimyasal Endüstri | APS: 325 Mesh, Purity: 99+ % |
| Niobium Aluminum Carbide (Nb2AlC) MAX Phase Micron Powder | NK0941 | Genel Endüstriyel Kullanım | APS: 325 Mesh, Purity: 99+ % |
| Carbon (C) (Graphite) Sputtering Targets | NK0942 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK0943 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Bismuth (III) Sulfide (Bi2S3) Nanopowder/Nanoparticles | NK0944 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 500 nm |
| Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 50 ml | NK0945 | Genel Endüstriyel Kullanım | |
| Nickel (Ni) Sputtering Targets | NK0946 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK0947 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Indium Oxide (In2O3) Micron Powder | NK0948 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh, White |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK0949 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK0950 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 625±25um |
| Prime CZ-Si Wafer | NK0951 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (111), Boron Doped, Resistivity: 1-20 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK0952 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Lead (Pb) Sputtering Targets | NK0953 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK0954 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Tungsten Titanium (TiW) Sputtering Targets | NK0955 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.995%, Size: 1”, Thickness: 0.250” |
| Titanium Foam for Battery and Supercapacitor Research | NK0956 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99+%, Size: 100 mm x100 mm x 2.8mm |
| Carbon Nanotube Sponges | NK0957 | Genel Endüstriyel Kullanım | Size: 10 mm x 10 mm, Thickness: 3-4 mm |
| Molybdenum (Mo) Sputtering Targets | NK0958 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Styrene-Butadiene Rubber (SBR) Binder for Li-ion Battery Anode Materials | NK0959 | Genel Endüstriyel Kullanım | |
| Carbon Nanotube-Carbon Black Prepared by Electrostatic Adsorption | NK0960 | Genel Endüstriyel Kullanım | CNTs: 34.4 wt%, Carbon Black: 65.6 wt% |
| Yttrium (Y) Sputtering Targets | NK0961 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK0962 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Cubic Boron Nitride Nanopowder | NK0963 | Genel Endüstriyel Kullanım | Cubic, Size: <250 nm Purity: 99.5% |
| Aluminum Silicon (AlSi) Sputtering Targets | NK0964 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0965 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK0966 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (111), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 280 ± 15 μm |
| Erbium Oxide (Er2O3) Sputtering Targets | NK0967 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Borosilicate Wafer | NK0968 | Genel Endüstriyel Kullanım | Size: 3”, 2-Side polished, Thickness: 500 ± 25 μm |
| Carbon Nanotube Buckypaper with Metal 0.8% | NK0969 | Genel Endüstriyel Kullanım | Thickness: 28 µm, Diameter: 35-39 mm |
| Carbon (C) (Graphite) Sputtering Targets | NK0970 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Molybdenum (Mo) Sputtering Targets | NK0971 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Molybdenum (Mo) Sputtering Targets | NK0972 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK0973 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0974 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Copper-Zinc Alloy Nanopowder | NK0975 | Genel Endüstriyel Kullanım | Cu55Zn45, Average Particle Size: 50nm, Purity: 99.9% |
| Lithium Battery Strapping Tape | NK0976 | Genel Endüstriyel Kullanım | Width: 10 mm, Thickness: 0.03 mm, Length: 100 m |
| Iron-Silicon Nanoparticles | NK0977 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fe65Si35, APS:50nm, Purity: 99.9% |
| Iron-Nickel Nanoparticles | NK0978 | Genel Endüstriyel Kullanım | Fe65Ni35, APS: 50nm, Purity: 99.9% |
| Copper Nickel Alloy Nanopowder | NK0979 | Genel Endüstriyel Kullanım | Cu55Ni45, APS: 50nm, Purity: 99.9% |
| Aluminum-Silicon (AlSi) Alloy Powder | NK0980 | Elektronik, Yarı İletkenler, Optik Malzemeler | Al85Si15, APS: 50nm, Purity: 99.9% |
| Silver Indium (Ag-In) Alloy Nanopowder/Nanoparticles | NK0981 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 40-100 nm |
| Vanadium Nitrade (VN) Nanopowder | NK0982 | Genel Endüstriyel Kullanım | APS: 40nm, Purity: 99.9% |
| Indium (In) Sputtering Targets | NK0983 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Dummy CZ-Si Wafer | NK0984 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1-50 (ohm.cm), 2-Side Polished, Thickness: 525 ± 25 μm |
| Prime CZ-Si Wafer | NK0985 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 280 ± 25 μm |
| Multi Walled Carbon Nanotubes Isopropanol Dispersion | NK0986 | Genel Endüstriyel Kullanım | 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm |
| Prime CZ-Si Wafer | NK0987 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 279 ± 20 μm |
| Multi Walled Carbon Nanotubes N-butanol Dispersion | NK0988 | Genel Endüstriyel Kullanım | 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm |
| CR2032 Coin Cell Cases with 304SS | NK0989 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height: 3.2 mm |
| Prime CZ-Si Wafer | NK0990 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (111), Arsenic Doped, Resistivity: 0, 001-, 0.005 (ohm.cm), 1-Side Polished, Thickness: 400 ± 25 μm |
| Cobalt (II) Chloride Hexahydrate (Cl2CoH12O6) | NK0991 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Erbium Oxide (Er2O3) Sputtering Targets | NK0992 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0993 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Aluminum Silicon (AlSi) Sputtering Targets | NK0994 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK0995 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Nickel Vanadium (NiV) Sputtering Targets | NK0996 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK0997 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0998 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Lead (Pb) Sputtering Targets | NK0999 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 2”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK1000 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 380 ± 25 μm |
| Aluminum (Al) Nanopowder/Nanoparticles | NK1001 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 770 nm, Metal Basis |
| Aluminum Tab for Pouch Li-ion Cell | NK1002 | Genel Endüstriyel Kullanım | Width: 4 mm, Length: 57 mm |
| Quartz Wafer | NK1003 | Genel Endüstriyel Kullanım | (X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm |
| Prime CZ-Si Wafer | NK1004 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Test CZ-Si Wafer | NK1005 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-20 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Borosilicate Wafer | NK1006 | Genel Endüstriyel Kullanım | Size: 3”, 1-Side polished, Thickness: 150 ± 25 μm |
| Dummy CZ-Si Wafer | NK1007 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (111), Phosphor Doped, Resistivity: 0, 001-100 (ohm.cm), 1-Side Polished, Thickness: 340 ± 25 μm |
| Prime CZ-Si Wafer | NK1008 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 380±25um |
| Borosilicate Wafer | NK1009 | Genel Endüstriyel Kullanım | Size: 4”, 1-Side polished, Thickness: 700 ± 25 μm |
| Carbon Nanotubes Highly Conductive Tapes with Metal 8% | NK1010 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Zinc (Zn) Sputtering Targets | NK1011 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1012 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 12 wt% Silicon (Si) Nanopowder/Nanoparticles | NK1013 | Elektronik, Yarı İletkenler, Optik Malzemeler | |
| Niobium (Nb) Sputtering Targets | NK1014 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 2”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1015 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Platinum (Pt) Nanopowder/Nanoparticles Dispersion | NK1016 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 10 nm, 1100 ppm |
| Nickel (Ni) Sputtering Targets | NK1017 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| CR2032 Coin Cell Case (Negative Case | NK1018 | Genel Endüstriyel Kullanım | Cone Spring, Spacer, Positive Case) |
| Thulium (III) oxide Micron Powder | NK1019 | Genel Endüstriyel Kullanım | Size: 3-5 um, Purity: 99.9 % |
| Aluminum (Al) Sputtering Targets | NK1020 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Cubic Boron Nitride Nanopowder | NK1021 | Genel Endüstriyel Kullanım | Cubic, Size: <200 nm Purity: 99.9% |
| Copper (Cu) Nanopowder/Nanoparticles | NK1022 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 80 nm, Metal Basis |
| Graphene Oxide Water Dispersion | NK1023 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Black Liquid, GO: 2, 0 wt% |
| Reduced Graphene Oxide Water Dispersion | NK1024 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, rGO: 2, 0 wt% |
| Silicon (Si) Sputtering Targets | NK1025 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1026 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK1027 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK1028 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 625±25um |
| Short Single Walled Carbon Nanotubes | NK1029 | Genel Endüstriyel Kullanım | Purity: > 92% |
| Nickel (Ni) Sputtering Targets | NK1030 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 2”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK1031 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Aluminum (Al) Sputtering Targets | NK1032 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK1033 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Graphite Fluoride (Carbon Monofluoride) Micron Powder | NK1034 | Genel Endüstriyel Kullanım | 8-10 micron, F/C Ratio : 1.2 |
| Aluminum (Al) Sputtering Targets | NK1035 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.125” |
| Tantalum (Ta) Nanopowder/Nanoparticles | NK1036 | Genel Endüstriyel Kullanım | High Purity: 99.9%, Size: 45-75 nm |
| Large Surface Area Single Walled Carbon Nanotubes | NK1037 | Genel Endüstriyel Kullanım | Purity: > 95%, SSA: 400 m2/g |
| Prime Si+SiO2 Wafer (dry) | NK1038 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 279 ± 20 μm, Coating 100 nm |
| (-OH) Functionalized Short Length Double Walled Carbon Nanotubes | NK1039 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Lithium Lanthanum Zirconate (LLZO | NK1040 | Genel Endüstriyel Kullanım | Li7La3Zr2O12), Purity: ≥99.5, Size: 0.3 -1 µm |
| Prime CZ-Si Wafer | NK1041 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (110), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Cobalt (Co) Sputtering Targets | NK1042 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK1043 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK1044 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Prime CZ-Si Wafer | NK1045 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Prime CZ-Si Wafer | NK1046 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 525 ± 25 μm |
| Dummy CZ-Si Wafer | NK1047 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 100 (ohm.cm), 1-Side Polished, Thickness: 650 ± 50 μm |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1048 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Praseodymium (Pr) Sputtering Targets | NK1049 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Dummy CZ-Si Wafer | NK1050 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Phosphor Doped, Resistivity: 0.001 – 100 (ohm.cm), 1-Side Polished, Thickness: 650 ± 50 μm |
| Borosilicate Wafer | NK1051 | Genel Endüstriyel Kullanım | Size: 4”, 1-Side polished, Thickness: 1000 ± 20 μm |
| Platinum Oxide (PtO2) Nanopowder/Nanoparticles | NK1052 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: <100 nm |
| Aluminum Silicon (AlSi) Sputtering Targets | NK1053 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1054 | Genel Endüstriyel Kullanım | Purity: 99.99% Size: 3”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1055 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Niobium (Nb) Sputtering Targets | NK1056 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK1057 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1058 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Copper (Cu) Nanopowder/Nanoparticles | NK1059 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 35 nm, Metal Basis |
| Tantalum (Ta) Sputtering Targets | NK1060 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1061 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1062 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Thulium (Tm) Micron Powder | NK1063 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Nickel (Ni) Sputtering Targets | NK1064 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 3”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1065 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 2”, Thickness: 0.250” |
| Single Layer Graphene Oxide | NK1066 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5 % |
| Magnesium (Mg) Sputtering Targets | NK1067 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 2”, Thickness: 0.125” |
| (-COOH) Functionalized Short Length Double Walled Carbon Nanotubes | NK1068 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Antimony (Sb) Sputtering Targets | NK1069 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| CR2016 Coin Cell Cases with 304SS (Positive+Negative Cases) | NK1070 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height : 1.6 mm |
| CR2325 Coin Cell Cases with 304SS (Positive+Negative Cases) | NK1071 | Genel Endüstriyel Kullanım | Diameter: 23 mm, Height : 2.5 mm |
| Tin (Sn) Micron Powder | NK1072 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 3 µm |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1073 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Niobium (Nb) Sputtering Targets | NK1074 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1075 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1076 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK1077 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Niobium (Nb) Sputtering Targets | NK1078 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 3”, Thickness: 0.125” |
| Aluminum Silicon (AlSi) Sputtering Targets | NK1079 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK1080 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Prime FZ-Si Wafer | NK1081 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Phosphor Doped, Resistivity: 7000 – 8000 (ohm.cm), 2-Side Polished, Thickness: 250 ± 15 μm |
| Prime CZ-Si Wafer | NK1082 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 2000 ± 50 μm |
| Prime CZ-Si Wafer | NK1083 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 8-12 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Prime Si+SiO2 Wafer (wet) | NK1084 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (111), Boron Doped, Resistivity: 1 -20 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm, Coating 500 nm |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1085 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 50 ml | NK1086 | Genel Endüstriyel Kullanım | |
| Iron (Fe) Nanopowder/Nanoparticles | NK1087 | Genel Endüstriyel Kullanım | Purity: 99.55+%, Size: 30-40 nm, Metal Basis |
| Aluminum (Al) Sputtering Targets | NK1088 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| (-OH) Functionalized Short Single Walled Carbon Nanotubes | NK1089 | Genel Endüstriyel Kullanım | Purity: >92% |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1090 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1091 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 4”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1092 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Niobium (Nb) Sputtering Targets | NK1093 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 3”, Thickness: 0.250” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1094 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1095 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1096 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Gallium Arsenide (GaAs) Wafers | NK1097 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 350± 25 μm, Single Side Polished, EPI-ready, Mobility: 1000-3000 |
| Gallium Arsenide (GaAs) Wafers | NK1098 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready, Dopant: Zinc (P Type) |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1099 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Scandium Oxide (Sc2O3) Micron Powder | NK1100 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Prime CZ-Si Wafer | NK1101 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 0, 01-0, 02 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Prime Si+SiO2 Wafer (wet) | NK1102 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 380 ± 25 μm, Coating 300 nm |
| Prime Si+SiO2 Wafer (dry) | NK1103 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 380 ± 25 μm, Coating 100 nm |
| Test CZ-Si Wafer | NK1104 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0, 001-0, 005 (ohm.cm), 2-Side Polished, Thickness: 200 ± 10 μm |
| Dummy CZ-Si Wafer | NK1105 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Boron Doped, Resistivity: 5-10 (ohm.cm), 1-Side Polished, Thickness: 675 ± 25 μm |
| Iron (II) Sulfate (FeSO4.xH2O) | NK1106 | Genel Endüstriyel Kullanım | Purity: > 98% |
| CR2450 Coin Cell Cases with 304SS (Positive+Negative Cases) | NK1107 | Genel Endüstriyel Kullanım | Diameter: 24 mm, Height : 5 mm |
| Aluminum 7075 Alloy Powder | NK1108 | Genel Endüstriyel Kullanım | Size: 15-53 µm, Spherical |
| Silver Conductive Adhesive Paste | NK1109 | Genel Endüstriyel Kullanım | |
| Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 100 ml | NK1110 | Genel Endüstriyel Kullanım | |
| Magnetic Graphene Aerogel | NK1111 | Elektronik, Batarya Elektrotları, Sensörler | Content of Fe3O4: 65%, Diameter: 1±0.1 cm |
| Impending Self-Help Transfer Nickel Graphene Foam | NK1112 | Elektronik, Batarya Elektrotları, Sensörler | Thickness: 1±0.1 mm, Size: 1×1 cm |
| Magnetic Graphene Aerogel | NK1113 | Elektronik, Batarya Elektrotları, Sensörler | Content of Fe3O4: 50%, Diameter: 1±0.1 cm |
| Zinc (Zn) Sputtering Targets | NK1114 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1115 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK1116 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 0.005 (ohm.cm), 2- Polished, Thickness: 200 ± 10 μm |
| Borosilicate Wafer | NK1117 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side polished, Thickness: 700 ± 20 μm |
| Hafnium (Hf) Micron Powder | NK1118 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 15-53 μm, Spherical |
| Prime CZ-Si Wafer | NK1119 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2- Polished, Thickness: 200 ± 10 μm |
| Prime CZ-Si Wafer | NK1120 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0, 01-0, 02 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Prime CZ-Si Wafer | NK1121 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 300 ± 25 μm |
| Graphitized Carbon Nanofibers | NK1122 | Genel Endüstriyel Kullanım | Purity: > 99.9%, Outside Diameter: 50-100 nm, Length: 1-15 μm |
| Borosilicate Wafer | NK1123 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side polished, Thickness: 500 ± 25 μm |
| Prime CZ-Si Wafer | NK1124 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: NG08SW0227 400±25um |
| CR2032 Coin Cell Case (Negative Case | NK1125 | Genel Endüstriyel Kullanım | Cone Spring, Spacer, Positive Case), Materials: 316SS |
| Carbon Nanotube (CNT) Nanoribbon | NK1126 | Genel Endüstriyel Kullanım | |
| Ultralight Graphene Aerogel | NK1127 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 1.2±0.1 cm, Height: 1.2±0.1 cm |
| Lithium Cobalt Oxide (LiCoO2) Coated Aluminum Foil | NK1128 | Genel Endüstriyel Kullanım | |
| Lithium Iron Phosphate (LiFePO4) Coated Aluminum Foil | NK1129 | Genel Endüstriyel Kullanım | |
| Indium (In) Sputtering Targets | NK1130 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1131 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Silicon Hexaboride (SiB6) Nanopowder | NK1132 | Elektronik, Yarı İletkenler, Optik Malzemeler | APS: 40nm, Purity: 99% |
| Carbon-Coated Aluminum Foil | NK1133 | Genel Endüstriyel Kullanım | |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1134 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1135 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK1136 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1137 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1138 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK1139 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Tungsten (W) Sputtering Targets | NK1140 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK1141 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1142 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1143 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Praseodymium (Pr) Sputtering Targets | NK1144 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Antimony (Sb) Sputtering Targets | NK1145 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Strong Graphene Aerogel | NK1146 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 1.2±0.1 cm, Height: 1.2±0.1 cm |
| Carbon Nanotubes(CNT) Modified Graphene Aerogel | NK1147 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 1.2±0.1cm, Height: 1.2±0.1cm |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1148 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK1149 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Tantalum (Ta) Sputtering Targets | NK1150 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1151 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 3”, Thickness: 0.250” |
| Prime Si+SiO2 Wafer (wet) | NK1152 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (111), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 381 ± 25 μm, Coating 500 nm |
| Magnesium (Mg) Sputtering Targets | NK1153 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 2”, Thickness: 0.250” |
| Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 100 ml | NK1154 | Genel Endüstriyel Kullanım | |
| Nickel Foam for Battery Cathode Substrate | NK1155 | Genel Endüstriyel Kullanım | Size: 1000 mm x 300 mm x 1.6 mm |
| Antimony (Sb) Sputtering Targets | NK1156 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Large Inner Diameter Thin Multi-Wall Carbon Nanotubes | NK1157 | Genel Endüstriyel Kullanım | Purity: > 92%, OD: 28-58 nm, ID: 18-48 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1158 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 4”, Thickness: 0.250” |
| Prime Si+SiO2 Wafer (dry) | NK1159 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 200 nm |
| Prime Si+SiO2 Wafer (wet) | NK1160 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 15 μm, Coating 300 nm |
| Prime CZ-Si Wafer | NK1161 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 0.05 – 0.152 (ohm.cm), 2-Side Polished, Thickness: 365 ± 15 μm |
| Prime Si+SiO2 Wafer (wet) | NK1162 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 300 nm |
| Prime Si+SiO2 Wafer (wet) | NK1163 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 400 nm |
| Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery | NK1164 | Genel Endüstriyel Kullanım | |
| Fused Silica Wafer | NK1165 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side Polished, Thickness: 1000 ± 25 μm |
| Fused Silica Wafer | NK1166 | Genel Endüstriyel Kullanım | Size: 10mm x 20mm, 2-Side Polished, Thickness: 500 ± 00 μm, |
| Magnesium (Mg) Sputtering Targets | NK1167 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 3”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1168 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1169 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| (-COOH) Functionalized Short Length Single Walled Carbon Nanotubes | NK1170 | Genel Endüstriyel Kullanım | Purity: > 92% |
| CR2032 Coin Cell Cases with 316SS | NK1171 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height: 3.2 mm |
| Prime CZ-Si Wafer | NK1172 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (111), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 625±25um |
| Silver (Ag) Nanopowder/Nanoparticles Dispersion | NK1173 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 14 nm, 52000 ppm |
| Carbon (C) (Graphite) Sputtering Targets | NK1174 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1175 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 5”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK1176 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1177 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1178 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK1179 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Short Length Double Walled Carbon Nanotubes | NK1180 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Single Walled Carbon Nanotubes | NK1181 | Genel Endüstriyel Kullanım | Purity: > 96%, Dia: 1.0 nm |
| Carbon (C) (Graphite) Sputtering Targets | NK1182 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1183 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Carbon Nanotubes Metal Tapes with Copper (Cu) 13 wt% | NK1184 | Genel Endüstriyel Kullanım | Thickness: 22 µm, Dia: 47 mm |
| Barium (Ba) Sputtering Targets | NK1185 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1186 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Barium (Ba) Sputtering Targets | NK1187 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Carbon Nanotubes Metal Films with Copper (Cu) 14 wt% | NK1188 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Aluminum (Al) Sputtering Targets | NK1189 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1190 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1191 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1192 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK1193 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK1194 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 500±25um |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1195 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Chromium (Cr) Nanopowder/Nanoparticles | NK1196 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 30-40 nm, Metal Basis |
| Magnesium (Mg) Sputtering Targets | NK1197 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 3”, Thickness: 0.250” |
| Magnetic Fe2O3@SiO2 powder | NK1198 | Genel Endüstriyel Kullanım | Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Positively-charged |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1199 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Carbon (C) (Graphite) Sputtering Targets | NK1200 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK1201 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525±25um |
| Indium Oxide (In2O3) Sputtering Targets | NK1202 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Prime Si+SiO2 Wafer (dry) | NK1203 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 100 nm |
| Bismuth (Bi) Sputtering Targets | NK1204 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1205 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1206 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 1”, Thickness: 0.125”, Dark Gray to Black |
| Borosilicate Wafer | NK1207 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side polished, Thickness: 500 ± 20 μm |
| Graphite Plate | NK1208 | Genel Endüstriyel Kullanım | Purity: 99.99%, D: 100mm x 20mm |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1209 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Prime FZ-Si Wafer | NK1210 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 2000 – 4000 (ohm.cm), 1-Side Polished, Thickness: 300 ± 10 μm |
| Magnetic Fe2O3@SiO2 powder | NK1211 | Genel Endüstriyel Kullanım | Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Negatively-charged |
| Magnetic Fe3O4@SiO2 powder | NK1212 | Genel Endüstriyel Kullanım | Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Positively-charged |
| Tin (Sn) Sputtering Targets | NK1213 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1214 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, indium, Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1215 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 4”, Thickness: 0.125” |
| Platinum Foil | NK1216 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 0.5mm, 1×1 cm |
| Magnetic Fe3O4@SiO2 powder | NK1217 | Genel Endüstriyel Kullanım | Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Negatively-charged |
| Borosilicate Wafer | NK1218 | Genel Endüstriyel Kullanım | Size: 6”, 1-Side polished, Thickness: 700 ± 25 μm |
| Tungsten (W) Sputtering Targets | NK1219 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| 18650 Cylinder Cell Case | NK1220 | Genel Endüstriyel Kullanım | |
| Platinum Foil | NK1221 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 1 mm, 1×1 cm |
| Manganese (Mn) Sputtering Targets | NK1222 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| AZ31 Spherical Magnesium Alloy Powder | NK1223 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Size: 15-53 µm, Purity: > 95 % |
| PE Separator Film for Battery Applications Thickness: 12μm | NK1224 | Genel Endüstriyel Kullanım | Width: 60mm, Length: 500 m, 1 roll: 500 m |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1225 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Titanium (Ti) Nanopowder/Nanoparticles | NK1226 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity:99.9+%, Size: 80-120 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1227 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1228 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1229 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 1”, Thickness: 0.125”, White to Gray |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1230 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 0.250” |
| CR2016 Coin Cell Cases with 316SS (Positive+Negative Cases) | NK1231 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height : 1.6 mm |
| Water-_17_.webp | NK1232 | Genel Endüstriyel Kullanım | |
| Hafnium Diboride Micron Powder | NK1233 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 1-3 μm |
| CR2450 Coin Cell Cases with 316SS (Positive+Negative Cases) | NK1234 | Genel Endüstriyel Kullanım | Diameter: 24 mm, Height : 5 mm |
| Chromium (Cr) Nanopowder/Nanoparticles | NK1235 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 100 nm, Metal Basis |
| Aluminum Silicon (AlSi) Sputtering Targets | NK1236 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1237 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK1238 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK1239 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Bismuth (Bi) Sputtering Targets | NK1240 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Borosilicate Wafer | NK1241 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side polished, Thickness: 200 ± 20 μm |
| Aluminum (Al) Sputtering Targets | NK1242 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Borosilicate Wafer | NK1243 | Genel Endüstriyel Kullanım | Size: 6”, 2-Side polished, Thickness: 700 ± 20 μm |
| CR2325 Coin Cell Cases with 316SS (Positive+Negative Cases) | NK1244 | Genel Endüstriyel Kullanım | Diameter: 23 mm, Height : 2.5 mm |
| Prime CZ-Si Wafer | NK1245 | Genel Endüstriyel Kullanım | Size: 8”, Orientation: (100), Phospor Doped, Resistivity: 0.001-0.005 (ohm.cm), 1-Side Polished, Thickness: 725 ± 20 μm |
| Magnesium (Mg) Sputtering Targets | NK1246 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1247 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 1”, Thickness: 0.125”, Grey to Black |
| Nickel (Ni) Sputtering Targets | NK1248 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK1249 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles | NK1250 | Seramik, Yarı İletken, Kimyasal Endüstri | Size: 55 nm, Ni:Ti/50:50 |
| (-COOH) Functionalized Double Walled Carbon Nanotubes | NK1251 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Nickel Vanadium (NiV) Sputtering Targets | NK1252 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK1253 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| 18650 Nickel Strip for Battery Tab | NK1254 | Genel Endüstriyel Kullanım | Width: 4 mm, Thickness: 0.1 mm, 1 Roll: 1 kg |
| Prime Si+Si3N4 Wafer | NK1255 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 381± 25 μm, Coating 150 nm |
| Carbon Nanotubes Highly Conductive Films | NK1256 | Genel Endüstriyel Kullanım | Thickness: 10-20 µm, Dia: 120-130 mm |
| Magnetic Fe2O3@SiO2 powder | NK1257 | Genel Endüstriyel Kullanım | Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Positively-charged |
| Magnetic Fe2O3@SiO2 powder | NK1258 | Genel Endüstriyel Kullanım | Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Negatively-charged |
| Prime Si+SiO2 Wafer (wet) | NK1259 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1000 nm |
| Vanadium (V) Micron Powder | NK1260 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Borosilicate Wafer | NK1261 | Genel Endüstriyel Kullanım | Size: 6”, 2- Side polished, Thickness: 1100 ± 20 μm |
| Lithium Cobalt Oxide (LiCoO2) Powder for Li-ion Battery Cathode Application | NK1262 | Genel Endüstriyel Kullanım | |
| Prime Si+Si3N4 Wafer | NK1263 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 150 nm |
| High Quality Natural Agate Mortar and Pestle | NK1264 | Genel Endüstriyel Kullanım | Size: 4″ |
| Magnesium (Mg) Sputtering Targets | NK1265 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 4”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1266 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Magnetic Fe3O4@SiO2 powder | NK1267 | Genel Endüstriyel Kullanım | Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Positively-charged |
| Nickel (Ni) Sputtering Targets | NK1268 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Aluminum Silicon (AlSi) Sputtering Targets | NK1269 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Bismuth (Bi) Sputtering Targets | NK1270 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1271 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.250” |
| Indium Oxide (In2O3) Sputtering Targets | NK1272 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1273 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Magnetic Fe3O4@SiO2 powder | NK1274 | Genel Endüstriyel Kullanım | Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Negatively-charged |
| Silver (Ag) Sputtering Targets | NK1275 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1276 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 7”, Thickness: 0.125” |
| Bismuth (Bi) Sputtering Targets | NK1277 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1278 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 8”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1279 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Tantalum (Ta) Sputtering Targets | NK1280 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Prime Si+SiO2 Wafer (wet) | NK1281 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1500 nm |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1282 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1283 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1284 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Selenium (Se) Sputtering Targets | NK1285 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK1286 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.125” |
| Magnetic Graphene Aerogel | NK1287 | Elektronik, Batarya Elektrotları, Sensörler | Content of Fe3O4: 65%, Diameter: 2±0.4 cm |
| Magnetic Graphene Aerogel | NK1288 | Elektronik, Batarya Elektrotları, Sensörler | Content of Fe3O4: 50%, Diameter: 2±0.4 cm |
| Lutetium Oxide (Lu2O3) Micron Powder | NK1289 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Magnetic Fe2O3@SiO2 powder | NK1290 | Genel Endüstriyel Kullanım | Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Positively-charged |
| Bismuth (Bi) Sputtering Targets | NK1291 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Ultralight Graphene Aerogel | NK1292 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 2±0.4 cm, Height: 2±0.4 cm |
| Indium (In) Sputtering Targets | NK1293 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1294 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1295 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1296 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK1297 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.125” |
| Aluminum Foil for Battery Cathode Substrate | NK1298 | Genel Endüstriyel Kullanım | Size: 350 m*280 mm*15 µm |
| Indium (In) Sputtering Targets | NK1299 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Graphene Sample Pack (Includes 9 products) | NK1300 | Elektronik, Batarya Elektrotları, Sensörler | |
| Magnetic Fe3O4@SiO2 powder | NK1301 | Genel Endüstriyel Kullanım | Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Positively-charged |
| Magnetic Fe2O3@SiO2 powder | NK1302 | Genel Endüstriyel Kullanım | Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Negatively-charged |
| Prime Si+SiO2 Wafer (wet) | NK1303 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 0.01 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 500 nm |
| Tungsten Titanium (TiW) Sputtering Targets | NK1304 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1305 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 1”, Thickness: 0.250”, Dark Gray to Black |
| Silicon (Si) Sputtering Targets | NK1306 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Titanium (Ti) Nanopowder/Nanoparticles | NK1307 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9+%, Size: 30-80 nm |
| Nickel Vanadium (NiV) Sputtering Targets | NK1308 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1309 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK1310 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Magnetic Fe3O4@SiO2 powder | NK1311 | Genel Endüstriyel Kullanım | Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Negatively-charged |
| Prime Si+Si3N4 Wafer | NK1312 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 525± 25 μm, Coating 70 nm |
| Copper (Cu) Sputtering Targets | NK1313 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Multi Walled Carbon Nanotubes N-butanol Dispersion | NK1314 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 18-28 nm, Length: 8-18 µm |
| Carbon Nanotubes(CNT) Modified Graphene Aerogel | NK1315 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 2±0.4 cm, Height: 2±0.4 cm |
| Praseodymium (Pr) Sputtering Targets | NK1316 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Boron (B) Sputtering Targets | NK1317 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Bismuth (Bi) Sputtering Targets | NK1318 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Tungsten (W) Nanopowder/Nanoparticles | NK1319 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 35-55 nm, Metal Basis |
| Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles | NK1320 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Sn:Cu/92:8 |
| Tungsten (W) Sputtering Targets | NK1321 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles | NK1322 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Sn:Cu/1:9 |
| Magnesium (Mg) Sputtering Targets | NK1323 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 5”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1324 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Yttrium (Y) Sputtering Targets | NK1325 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1326 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 4”, Thickness: 0.125” |
| Multi Walled Carbon Nanotubes Ethanol Dispersion | NK1327 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96 %, OD: 45-75 nm, Length 8-28 µm |
| Magnetic Fe2O3@SiO2 powder | NK1328 | Genel Endüstriyel Kullanım | Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Positively-charged |
| Prime Si+Si3N4 Wafer | NK1329 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 525± 25 μm, Coating 150 nm |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1330 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1331 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 1”, Thickness: 0.250”, Grey to Black |
| Vanadium (V) Sputtering Targets | NK1332 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1333 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1334 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 1”, Thickness: 0.250”, White to Gray |
| Silicon (Si) Nanopowder/Nanoparticles | NK1335 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 97+%, Size: 25-35 nm, Oxygen Content: < 3% |
| Magnetic Fe3O4@SiO2 powder | NK1336 | Genel Endüstriyel Kullanım | Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Positively-charged |
| Ãrün-Görselleri-_6_.webp | NK1337 | Genel Endüstriyel Kullanım | |
| Holey Super Graphene | NK1338 | Elektronik, Batarya Elektrotları, Sensörler | |
| Copper (Cu) Sputtering Targets | NK1339 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1340 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Magnetic Fe2O3@SiO2 powder | NK1341 | Genel Endüstriyel Kullanım | Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Negatively-charged |
| Cobalt Acetate (C4H6CoO4) | NK1342 | Genel Endüstriyel Kullanım | Purity: > 98% |
| Nickel Vanadium (NiV) Sputtering Targets | NK1343 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Bismuth (Bi) Sputtering Targets | NK1344 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1345 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Magnetic Fe3O4@SiO2 powder | NK1346 | Genel Endüstriyel Kullanım | Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Negatively-charged |
| Lead (Pb) Sputtering Targets | NK1347 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 3”, Thickness: 0.125” |
| Gadolinium (Gd) Micron Powder | NK1348 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Molybdenum (Mo) Sputtering Targets | NK1349 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Selenium (Se) Sputtering Targets | NK1350 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1351 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Fused Silica Wafer | NK1352 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm |
| Fused Silica Wafer | NK1353 | Genel Endüstriyel Kullanım | Size: 6”, 2-Side Polished, Thickness: 700 ± 25 μm |
| Prime Si+Si3N4 Wafer | NK1354 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 381± 25 μm, Coating 300 nm |
| Prime FZ-Si Wafer | NK1355 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (111), None Doped, Resistivity: 10000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 300 ± 20 μm |
| Carbon Nanotube Fibres | NK1356 | Genel Endüstriyel Kullanım | Fiber diameter: 60-80 µm, Tensile Strength: 310-500 MPa, Electrical conductivity: 1×10^5~2×10^5 S/m |
| Selenium (Se) Sputtering Targets | NK1357 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK1358 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1359 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles | NK1360 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Fe:Ni:Co/55:28:17 |
| Impending Self-Help Transfer Nickel Graphene Foam | NK1361 | Elektronik, Batarya Elektrotları, Sensörler | Thickness: 1±0.1 mm, Size: 2×2 cm |
| Barium (Ba) Sputtering Targets | NK1362 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Barium (Ba) Sputtering Targets | NK1363 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1364 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1365 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 0.250” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1366 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1367 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Molybdenum Aluminum Boride (MoAlB) Max Phase Powder | NK1368 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 200 mesh |
| Magnetic Fe2O3@SiO2 powder | NK1369 | Genel Endüstriyel Kullanım | Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Positively-charged |
| Prime Si+SiO2 Wafer (dry) | NK1370 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 2-Side Polished, Thickness: 675 ± 15 μm, Coating 200 nm |
| Prime FZ-Si Wafer | NK1371 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), None Doped, Resistivity: 1000 – 10000 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Strong Graphene Aerogel | NK1372 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 2±0.4 cm, Height: 2±0.4 cm |
| Vanadium (V) Micron Powder | NK1373 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 100 mesh |
| Flash-Ignited Multi-Walled Carbon Nanotubes | NK1374 | Genel Endüstriyel Kullanım | MWCNTs: 48 wt%, Fe Nanoparticles: 23 wt%, Amorphous Carbon: 23 wt% |
| Aluminum Laminated Film | NK1375 | Genel Endüstriyel Kullanım | Width: 400 mm, Length: 7.5 m |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1376 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1377 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1378 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1379 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Magnetic Fe2O3@SiO2 powder | NK1380 | Genel Endüstriyel Kullanım | Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Negatively-charged |
| Nickel(II) Nitrate Hexahydrate (Ni(NO₃)₂*6H₂O) | NK1381 | Genel Endüstriyel Kullanım | Purity: > 98% |
| Silver (Ag) Nanopowder/Nanoparticles Water Dispersion | NK1382 | Genel Endüstriyel Kullanım | Size: 15 nm, Tawny Color, 55.000 ppm |
| Magnetic Fe3O4@SiO2 powder | NK1383 | Genel Endüstriyel Kullanım | Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Negatively-charged |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1384 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1385 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1386 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Molybdenum (Mo) Sputtering Targets | NK1387 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1388 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1389 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1390 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Lead (Pb) Sputtering Targets | NK1391 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 4”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1392 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in 2-Propanol | NK1393 | Genel Endüstriyel Kullanım | Gamma, Size: 12 nm, 12 wt% |
| Prime FZ-Si Wafer | NK1394 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 3000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 200 ± 10 μm |
| Prime FZ-Si Wafer | NK1395 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 5000 – 500000 (ohm.cm), 2-Side Polished, Thickness: 300 ± 10 μm |
| Antimony (Sb) Sputtering Targets | NK1396 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Boron Oxide (B2O3) Nanopowder/Nanoparticles | NK1397 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 50 nm |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1398 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK1399 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 80 ppm Dry powder |
| Silicon (Si) Sputtering Targets | NK1400 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Hand-Held Disc Cutter with Ring Cutting Dies | NK1401 | Genel Endüstriyel Kullanım | ID: 8, 15, 18, 20 mm |
| Manganese (Mn) Sputtering Targets | NK1402 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Aluminum Nickel Composite Strip for Battery Tab | NK1403 | Genel Endüstriyel Kullanım | Width: 4 mm, Thickness: 0.1 mm, 1Roll: 1 kg |
| Tungsten (W) Sputtering Targets | NK1404 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1405 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Cobalt (Co) Nanopowder/Nanoparticles | NK1406 | Genel Endüstriyel Kullanım | Purity: 99.85%, Size: 28 nm, Carbon Coated |
| Prime Si+Si3N4 Wafer | NK1407 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Arsenic Doped, Resistivity: 0, 001-0, 005 (ohm.cm), 1 Side Polished, Thickness: 525± 25 μm, Coating 450 nm |
| Prime FZ-Si Wafer | NK1408 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), None Doped, Resistivity: 10000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 380 ± 25 μm |
| Multi Walled Carbon Nanotubes Ethanol Dispersion | NK1409 | Genel Endüstriyel Kullanım | 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm |
| Selenium (Se) Sputtering Targets | NK1410 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK1411 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Carbon Nanotubes Highly Conductive Films with Metal 8% | NK1412 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Multi Walled Carbon Nanotubes N-butanol Dispersion | NK1413 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 95%, OD: 8-16 nm, Length: 45 µm |
| Multi Walled Carbon Nanotubes Ethanol Dispersion | NK1414 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 3-13 nm, Length: 45 µm |
| Carbon Nanotubes Metal Films with Nickel (Ni) 12 wt% | NK1415 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Multi Walled Carbon Nanotubes Isopropanol Dispersion | NK1416 | Genel Endüstriyel Kullanım | 4wt%, Purity: > 96%, OD: 4-12 nm, Length: 55 µm |
| Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion | NK1417 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 4-13 nm, Length: 45 µm |
| Multi Walled Carbon Nanotubes Isopropanol Dispersion | NK1418 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 95%, OD: 18-35 nm, Length: 8-18 µm |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1419 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size:3”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1420 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1421 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, indium, Purity: 99.995%, Size: 1”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1422 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Tungsten Titanium (TiW) Sputtering Targets | NK1423 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Praseodymium (Pr) Sputtering Targets | NK1424 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1425 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 4”, Thickness: 0.250” |
| Boron Doped Graphene Nanopowder (B/G) | NK1426 | Elektronik, Batarya Elektrotları, Sensörler | |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1427 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Titanium Boride (TiB2) Sputtering Targets | NK1428 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Quartz Wafer | NK1429 | Genel Endüstriyel Kullanım | (AT-Cut), Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm |
| Quartz Wafer | NK1430 | Genel Endüstriyel Kullanım | (ST-Cut), Size: 4”, 1-Side Polished, Thickness: 625 ± 25 μm |
| Carbon Nanotube Wire | NK1431 | Genel Endüstriyel Kullanım | Diameter: 30-50 μm, Hardness: 1.0-1.5 GPa |
| Molybdenum (Mo) Sputtering Targets | NK1432 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Quartz Wafer | NK1433 | Genel Endüstriyel Kullanım | (X-Cut), Size: 4”, 2-Side Polished, Thickness: 300 ± 25 μm |
| Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles | NK1434 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Sn:Cu/9:1 |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1435 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1436 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Selenium (Se) Sputtering Targets | NK1437 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Boron (B) Sputtering Targets | NK1438 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Bismuth (Bi) Sputtering Targets | NK1439 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Lead (Pb) Sputtering Targets | NK1440 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 3”, Thickness: 0.250” |
| Titanium Nitride (TiN) Sputtering Targets | NK1441 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1442 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1443 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1444 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK1445 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1446 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1447 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1448 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1449 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Carbon (C) Sputtering Targets | NK1450 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1451 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1452 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1453 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1454 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Germanium (Ge) Sputtering Targets | NK1455 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1456 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 0.125” |
| Water-_20_.webp | NK1457 | Genel Endüstriyel Kullanım | |
| Diamond (C) Nanopowder/Nanoparticles | NK1458 | Genel Endüstriyel Kullanım | Purity: 99%, Size: 10 nm |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1459 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1460 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1461 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lead (Pb) Sputtering Targets | NK1462 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 4”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1463 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1464 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black |
| Germanium (Ge) Micron Powder | NK1465 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 100 mesh |
| Copper (Cu) Sputtering Targets | NK1466 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Magnesium (Mg) Micron Powder | NK1467 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 0-200 µm |
| Bismuth (Bi) Sputtering Targets | NK1468 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1469 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1470 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1471 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1472 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Carbon (C) Sputtering Targets | NK1473 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Tungsten Titanium (TiW) Sputtering Targets | NK1474 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| High Purity Atomized Spherical Magnesium (Mg) Powder NGW120 | NK1475 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1476 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Aluminum Laminated Film for Pouch Cell Case | NK1477 | Genel Endüstriyel Kullanım | |
| Nickel Vanadium (NiV) Sputtering Targets | NK1478 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1479 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| PTFE Separator Film for Battery Applications Thickness: 50μm | NK1480 | Genel Endüstriyel Kullanım | Width: 60mm, Length: 600 m, 1 roll: 600 m |
| Boron (B) Sputtering Targets | NK1481 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1482 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Carbon Nanotube Sponges | NK1483 | Genel Endüstriyel Kullanım | Size: 20 mm x 20 mm, Thickness: 1-2 mm |
| Tin (Sn) Sputtering Targets | NK1484 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1485 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK1486 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 130 ppm Dry powder |
| Li-Ion Battery Separator Film | NK1487 | Genel Endüstriyel Kullanım | Thickness: 25 μm, Width: 60 mm, Length: 500 m, 1 Roll: 500 m |
| Copper Zinc (Cu-Zn) Alloy Nanopowder/Nanoparticles | NK1488 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Cu:Zn/6:4 |
| Iron Nickel (Fe-Ni) Alloy Nanopowder/Nanoparticles | NK1489 | Genel Endüstriyel Kullanım | Size: 30-90 nm, Fe:Ni/5:5 |
| Copper Zinc (Cu-Zn) Alloy Nanopowder/Nanoparticles | NK1490 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Cu:Zn/5:5 |
| Chromium (Cr) Sputtering Targets | NK1491 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Magnesium (Mg) Micron Powder | NK1492 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 0-100 µm |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1493 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1494 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Germanium (Ge) Micron Powder | NK1495 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 5 µm |
| High Purity Atomized Spherical Magnesium (Mg) Powder NGW60 | NK1496 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | |
| Fullerene-C60 | NK1497 | Genel Endüstriyel Kullanım | Purity: 95% |
| Nickel (Ni) Sputtering Targets | NK1498 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1499 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK1500 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 1”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1501 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, indium, Purity: 99.995%, Size: 2”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1502 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK1503 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1504 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1505 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1506 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1507 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1508 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1509 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1510 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Silver (Ag) Sputtering Targets | NK1511 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1512 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1513 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotube Sponges | NK1514 | Genel Endüstriyel Kullanım | Size: 50 mm x 10 mm, Thickness: 1-2 mm |
| Carbon Nanotube Fibres | NK1515 | Genel Endüstriyel Kullanım | Fiber diameter: 5-12 µm, Tensile Strength: 800-1000 MPa, Electrical conductivity: 5×10^4~7×10^4 S/m |
| Silicon (Si) Sputtering Targets | NK1516 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 8”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1517 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Carbon Nanotube Wire | NK1518 | Genel Endüstriyel Kullanım | Diameter: 60-100 μm, Hardness: 350-500 MPa |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1519 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1520 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1521 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1522 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Tungsten Titanium (TiW) Sputtering Targets | NK1523 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1524 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1525 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Carbon Nanotube Wire | NK1526 | Genel Endüstriyel Kullanım | Diameter: 120-150 μm, Hardness: 350-500 MPa |
| Iron (II) Acetate Fe(C2H3O2)2 | NK1527 | Genel Endüstriyel Kullanım | Purity: > 95% |
| Nickel Foil | NK1528 | Genel Endüstriyel Kullanım | Purity: 99.9+% , Thickness: 0.03mm, Width: 100mm |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1529 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Indium (In) Micron Powder | NK1530 | Genel Endüstriyel Kullanım | Purity:99.99%, APS:1-5 µm, Spherical |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1531 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1532 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 5”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1533 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1534 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Iron Chromium Cobalt (Fe-Cr-Co) Alloy Nanopowder/Nanoparticles | NK1535 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Fe:Cr:Co/64:25:11 |
| Nickel (Ni) Sputtering Targets | NK1536 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1537 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1538 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size:4”, Thickness: 0.125” |
| Aluminum (Al) Nanopowder/Nanoparticles | NK1539 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 18 nm, Laser Synthesized |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1540 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 2”, Thickness: 0.250”, Grey to Black |
| Tantalum (Ta) Sputtering Targets | NK1541 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1542 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1543 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK1544 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1545 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 8”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK1546 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1547 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1548 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1549 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1550 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 2”, Thickness: 0.125”, Dark Gray to Black |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1551 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1552 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Yttrium (Y) Sputtering Targets | NK1553 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1554 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1555 | Pigment, Manyetik Malzemeler, Katalizörler | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1556 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Carbon Nanotube Sponges | NK1557 | Genel Endüstriyel Kullanım | Size: 20 mm x 20 mm, Thickness: 3-4 mm |
| Borosilicate Wafer | NK1558 | Genel Endüstriyel Kullanım | Size: 8”, 2-Side Polished, Thickness: 1250 ± 25 μm |
| Silicon Carbide (SiC) Sputtering Targets | NK1559 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1560 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1561 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Tungsten (W) Sputtering Targets | NK1562 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1563 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1564 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1565 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Fullerene-C60 | NK1566 | Genel Endüstriyel Kullanım | Purity: 98% |
| Tungsten Titanium (TiW) Sputtering Targets | NK1567 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Indium Phosphide (InP) Wafers | NK1568 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350± 25 μm, Orientation: 100, Single Side Polished, Testing Grade |
| Titanium Boride (TiB2) Sputtering Targets | NK1569 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1570 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 6”, Thickness: 0.125” |
| Nickel Foil | NK1571 | Genel Endüstriyel Kullanım | Purity: 99.9+% , Thickness: 0.08mm, Width: 100mm |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1572 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1573 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 5”, Thickness: 0.250” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1574 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 2”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK1575 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1576 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 2”, Thickness: 0.125”, White to Gray |
| Silicon (Si) Sputtering Targets | NK1577 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1578 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Prime Si+Si3N4 Wafer | NK1579 | Genel Endüstriyel Kullanım | Size: 4”, Orientaion: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 1000 nm |
| Silicon Carbide (SiC) Sputtering Targets | NK1580 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1581 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1582 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1583 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 0.250” |
| Antimony (Sb) Sputtering Targets | NK1584 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1585 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1586 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK1587 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Chromium Aluminum Boride (Cr2AlB2) Max Phase Powder | NK1588 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 200 mesh |
| Shape Memory Polymer NGM9020 | NK1589 | Genel Endüstriyel Kullanım | Ether Type |
| Platinum (Pt) Nanopowder/Nanoparticles | NK1590 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 15 nm |
| Indium (In) Sputtering Targets | NK1591 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Copper-Carbon Nanotube Fibers Composite Wires | NK1592 | Genel Endüstriyel Kullanım | Cu-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1×10^7 S/m |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1593 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1594 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1595 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1596 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 6”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1597 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1598 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1599 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Vanadium (V) Sputtering Targets | NK1600 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1601 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Shape Memory Polymer NGM7520 | NK1602 | Genel Endüstriyel Kullanım | Ether Type |
| Fullerene-C60 | NK1603 | Genel Endüstriyel Kullanım | Purity: 99% |
| Shape Memory Polymer NGS2520 | NK1604 | Genel Endüstriyel Kullanım | Solution Type |
| Indium Phosphide (InP) Wafers | NK1605 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Orientation: 100, Single Side Polished, EPI-Ready |
| High Purity Atomized Spherical Magnesium (Mg) Powder NGW40 | NK1606 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | |
| Tungsten Titanium (TiW) Sputtering Targets | NK1607 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK1608 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 250 ppm Dry powder |
| Indium Phosphide (InP) Wafers | NK1609 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready |
| Magnesium (Mg) Sputtering Targets | NK1610 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1611 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Barium (Ba) Sputtering Targets | NK1612 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Iron Aluminum Boride (Fe2AlB2) Max Phase Powder | NK1613 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 200 mesh |
| Silver-Carbon Nanotube Fibers Composite Wires | NK1614 | Genel Endüstriyel Kullanım | Ag-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1.5×10^7 S/m |
| Barium (Ba) Sputtering Targets | NK1615 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Germanium (Ge) Sputtering Targets | NK1616 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK1617 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Aluminum Nitride (AlN) Sputtering Targets | NK1618 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 1”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1619 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1620 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK1621 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Germanium (Ge) Sputtering Targets | NK1622 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Tin Oxide (SnO2) Sputtering Targets | NK1623 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Gold (Au) Nanopowder/Nanoparticles | NK1624 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 50-100 nm |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1625 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1626 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Quartz Wafer | NK1627 | Genel Endüstriyel Kullanım | (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm |
| Hafnium Oxide (HfO2) Pellet | NK1628 | Genel Endüstriyel Kullanım | Granule Type, Color: Black, Purity: 99.99%, Size: 1-3mm |
| Hafnium Oxide (HfO2) Pellet | NK1629 | Genel Endüstriyel Kullanım | Granule Type, Color: White, Purity:99.99%, Size:1-3mm |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1630 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1631 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1632 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1633 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 8”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafers | NK1634 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 450±25 μm, Single Side Polished, EPI-ready, Dopant: Silicon (N Type) |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1635 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1636 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1637 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK1638 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1639 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1640 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1641 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Sulphur (S) Nanopowder/Nanoparticles | NK1642 | Genel Endüstriyel Kullanım | High Purity: 99.995%, Size: 47 nm |
| Fullerene-C60 | NK1643 | Genel Endüstriyel Kullanım | Purity: 99.5% |
| Shape Memory Polymer NGM6520 | NK1644 | Genel Endüstriyel Kullanım | Ether Type |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1645 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1646 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1647 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK1648 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1649 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1650 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Chromium (Cr) Sputtering Targets | NK1651 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1652 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1653 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK1654 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 6”, Thickness: 0.250” |
| Shape Memory Polymer NGM5520 | NK1655 | Genel Endüstriyel Kullanım | Ether Type |
| Indium (In) Sputtering Targets | NK1656 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1657 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1658 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Yttrium (Y) Sputtering Targets | NK1659 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1660 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 2”, Thickness: 0.250”, Dark Gray to Black |
| Indium (In) Sputtering Targets | NK1661 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1662 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Manganese (Mn) Sputtering Targets | NK1663 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK1664 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Tungsten (W) Sputtering Targets | NK1665 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1666 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Indium Oxide (In2O3) Sputtering Targets | NK1667 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Silicon Carbide (SiC) Sputtering Targets | NK1668 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1669 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1670 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 2”, Thickness: 0.250”, White to Gray |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1671 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1672 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Graphene Sheet | NK1673 | Elektronik, Batarya Elektrotları, Sensörler | Size: 29 cm x 39 cm, Thickness: 35 µm, Highly Conductive |
| Zinc Oxide (ZnO) Sputtering Targets | NK1674 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1675 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1676 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 6”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1677 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1678 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Manganese (Mn) Sputtering Targets | NK1679 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Shape Memory Polymer NGM4520 | NK1680 | Genel Endüstriyel Kullanım | Ether Type |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1681 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 3”, Thickness: 0.125”, Grey to Black |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1682 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Aluminum (Al) Nanopowder/Nanoparticles | NK1683 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 38 nm, Metal Basis |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 450 nm | NK1684 | Genel Endüstriyel Kullanım | |
| Thermoplastic Carbon Paste | NK1685 | Genel Endüstriyel Kullanım | Drying Temperature: <100 °C |
| Quantum Dots Magnetic Microspheres 615 nm | NK1686 | Genel Endüstriyel Kullanım | |
| Quantum Dots Magnetic Microspheres 525 nm | NK1687 | Genel Endüstriyel Kullanım | |
| Quantum Dots Microspheres 615 nm | NK1688 | Genel Endüstriyel Kullanım | |
| Quantum Dots Microspheres 525 nm | NK1689 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 528 nm | NK1690 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 515 nm | NK1691 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 505 nm | NK1692 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 420 nm | NK1693 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 645 nm | NK1694 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 625 nm | NK1695 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 545 nm | NK1696 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 525 nm | NK1697 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 500 nm | NK1698 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 470 nm | NK1699 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 700 nm | NK1700 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 625 nm | NK1701 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 600 nm | NK1702 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 560 nm | NK1703 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 525 nm | NK1704 | Genel Endüstriyel Kullanım | |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1705 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafers | NK1706 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Double Side Polished, EPI-ready, Dopant: Zinc (P Type) |
| Tin (Sn) Sputtering Targets | NK1707 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1708 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Carbon Nanotube Sponges | NK1709 | Genel Endüstriyel Kullanım | Size: 50 mm x 10 mm, Thickness: 3-4 mm |
| Boron Nitride (BN) Sputtering Targets | NK1710 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1711 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1712 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Bismuth (Bi) Nanopowder/Nanoparticles | NK1713 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 78 nm, Metal Basis |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1714 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1715 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK1716 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silver Conductive Paste | NK1717 | Genel Endüstriyel Kullanım | Surface Curing: ~80℃ |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1718 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Gallium Arsenide (GaAs) Wafers | NK1719 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 400±25 μm, Double Side Polished, EPI-ready |
| Boron (B) Sputtering Targets | NK1720 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Indium Oxide (In2O3) Sputtering Targets | NK1721 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1722 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1723 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Thermoplastic Carbon Paste for Long-term Cell Degradation | NK1724 | Genel Endüstriyel Kullanım | |
| Nickel (Ni) Sputtering Targets | NK1725 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 8”, Thickness: 0.250” |
| Carbon Nanotube Wire | NK1726 | Genel Endüstriyel Kullanım | Diameter: 5-15 μm, Hardness: 1.0-1.5 GPa |
| High-Performance Copper Foil Rolls for Lithium Ion Battery | NK1727 | Genel Endüstriyel Kullanım | Size: 10 µm |
| Cobalt Oxalate (CoC2O4) | NK1728 | Genel Endüstriyel Kullanım | Purity: > 98% |
| High Purity Atomized Spherical Magnesium (Mg) Powder NGW20 | NK1729 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1730 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Fullerene-C60 | NK1731 | Genel Endüstriyel Kullanım | Purity: 99.9% |
| Meshed Lithium Air CR2032 Coin Cell Case with 304SS | NK1732 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height: 3.2 mm |
| Thermoset Carbon Paste (140 ℃ | NK1733 | Genel Endüstriyel Kullanım | 100 ohm/sqr/25µm), 15-20 µm |
| Thermoset Carbon Paste (140 ℃ | NK1734 | Genel Endüstriyel Kullanım | 1000 ohm/sqr/25µm, 10-15 µm) |
| Vanadium (V) Sputtering Targets | NK1735 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1736 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Thermoplastic Carbon Paste | NK1737 | Genel Endüstriyel Kullanım | Drying Temperature: 120˚C for 10 minutes |
| Selenium (Se) Sputtering Targets | NK1738 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1739 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness:0.125” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1740 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Shape Memory Polymer NGM2520 | NK1741 | Genel Endüstriyel Kullanım | Ether Type |
| Thermoset Carbon Paste (140℃ | NK1742 | Genel Endüstriyel Kullanım | <20 ohm/sqr/25µm), 10-12 µm |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1743 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Boron (B) Sputtering Targets | NK1744 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1745 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1746 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1747 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Praseodymium (Pr) Sputtering Targets | NK1748 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1749 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1750 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1751 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1752 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Boron (B) Sputtering Targets | NK1753 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1754 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK1755 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1756 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 3”, Thickness: 0.250”, Grey to Black |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1757 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”, Grey to Black |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1758 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1759 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1760 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1761 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1762 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Titanium Nitride (TiN) Sputtering Targets | NK1763 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1764 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1765 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1766 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 500 ml | NK1767 | Genel Endüstriyel Kullanım | |
| Manganese (Mn) Sputtering Targets | NK1768 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1769 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Boron Nitride (BN) Sputtering Targets | NK1770 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1771 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1772 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1773 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tungsten (W) Sputtering Targets | NK1774 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Nickel Oxide (NiO) Sputtering Targets | NK1775 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size:1”, Thickness: 0.125” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1776 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK1777 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK1778 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1779 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK1780 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size:1”, Thickness: 0.125” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK1781 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1782 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1783 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1784 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 4”, Thickness: 0.125”, Grey to Black |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1785 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 3”, Thickness: 0.125” |
| Gold (Au) Nanopowder/Nanoparticles | NK1786 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 28 nm |
| Yttrium (Y) Sputtering Targets | NK1787 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Tin Oxide (SnO2) Sputtering Targets | NK1788 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1789 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1790 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK1791 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1792 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1793 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1794 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1795 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1796 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1797 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1798 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1799 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Selenium (Se) Sputtering Targets | NK1800 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK1801 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 5”, Thickness: 0.125” |
| Carbon Nanotube Fibres | NK1802 | Genel Endüstriyel Kullanım | Fiber Diameter: 5-12 µm, Tensile Strength 1000-1200 MPa, Electrical conductivity 5×10^4~7×10^4 S/m |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1803 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Tungsten (W) Sputtering Targets | NK1804 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Vanadium (V) Sputtering Targets | NK1805 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.250” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1806 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1807 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1808 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK1809 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Lithium Nickel Cobalt Oxide (LiNi(1-x)CoxO2) Sputtering Targets | NK1810 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1811 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK1812 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1813 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 4”, Thickness: 0.250”, Grey to Black |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1814 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| High-Performance Copper Foil Rolls for Lithium Ion Battery | NK1815 | Genel Endüstriyel Kullanım | Size: 25 µm |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1816 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Indium (In) Nanopowder/Nanoparticles | NK1817 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 70 nm, Tetragonal |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1818 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1819 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK1820 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 5”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1821 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 8”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1822 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1823 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK1824 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK1825 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK1826 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1827 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK1828 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1829 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1830 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1831 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1832 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 6”, Thickness: 0.250” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1833 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1834 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1835 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Boron Carbide (B4C) Sputtering Targets | NK1836 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1837 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1838 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1”, Thickness: 0.125”, Beige to White |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1839 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Li-Ion Battery Separator Film | NK1840 | Genel Endüstriyel Kullanım | Length: 800 m, Width: 85 mm, Thickness: 25 μm |
| Stainless Steel Two-Electrode Split Test Cell | NK1841 | Genel Endüstriyel Kullanım | |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1842 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK1843 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 450 nm | NK1844 | Genel Endüstriyel Kullanım | |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1845 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Boron Nitride (BN) Sputtering Targets | NK1846 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Indium Phosphide Quantum Dots (InP/ZnS QD) 700 nm | NK1847 | Genel Endüstriyel Kullanım | |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1848 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1849 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1850 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1851 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK1852 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 500 ppm Dry powder |
| Gold-Carbon Nanotube Fibers Composite Wires | NK1853 | Genel Endüstriyel Kullanım | Au-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1×10^7 S/m |
| Indium Phosphide Quantum (InP/ZnS QD) Dots 625 nm | NK1854 | Genel Endüstriyel Kullanım | |
| Tin Oxide (SnO2) Sputtering Targets | NK1855 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1856 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Tungsten (W) Sputtering Targets | NK1857 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1858 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1859 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1860 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1861 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Praseodymium (Pr) Sputtering Targets | NK1862 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 420 nm | NK1863 | Genel Endüstriyel Kullanım | |
| Boron Carbide (B4C) Sputtering Targets | NK1864 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 6”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK1865 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size:1”, Thickness: 0.250” |
| Gold (Au) Nanopowder/Nanoparticles | NK1866 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 14 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1867 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, indium, Purity: 99.995%, Size: 4”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1868 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK1869 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1870 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Titanium Boride (TiB2) Sputtering Targets | NK1871 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Indium Phosphide Quantum (InP/ZnS QD) Dots 600 nm | NK1872 | Genel Endüstriyel Kullanım | |
| Boron Carbide (B4C) Sputtering Targets | NK1873 | Genel Endüstriyel Kullanım | Purity: 99.5, Size: 8”, Thickness: 0.250” |
| Tungsten (W) Sputtering Targets | NK1874 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1875 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1876 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Boron Carbide (B4C) Sputtering Targets | NK1877 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1878 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK1879 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1880 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1881 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1882 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK1883 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK1884 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Electrolyte Lithium Hexafluorophosphate (LiPF6) for Lithium-ion Battery Research Development | NK1885 | Genel Endüstriyel Kullanım | 1 Kg in Stainless Steel Container |
| Titanium Boride (TiB2) Sputtering Targets | NK1886 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1887 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1888 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Titanium Carbide (TiC) Sputtering Targets | NK1889 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1890 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1891 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1892 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1893 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1894 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK1895 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Indium Phosphide Quantum Dots (InP/ZnS QD) 560 nm | NK1896 | Genel Endüstriyel Kullanım | |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK1897 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK1898 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Tin Oxide (SnO2) Sputtering Targets | NK1899 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1900 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1901 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1902 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 2”, Thickness: 0.125”, Beige to White |
| Silver Nanowires Suspension in Ethanol | NK1903 | Genel Endüstriyel Kullanım | Purity: > 99 wt%, Diameter : 50 nm |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1904 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1905 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 3”, Thickness: 0.125”, White to Gray |
| Indium Phosphide Quantum Dots (InP/ZnS QD) 525 nm | NK1906 | Genel Endüstriyel Kullanım | |
| Tungsten Titanium (TiW) Sputtering Targets | NK1907 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1908 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Boron Nitride (BN) Sputtering Targets | NK1909 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Titanium Carbide (TiC) Sputtering Targets | NK1910 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1911 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Titanium Nitride (TiN) Sputtering Targets | NK1912 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1913 | Seramik, Yarı İletken, Kimyasal Endüstri | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black |
| Zinc Oxide (ZnO) Sputtering Targets | NK1914 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 500 ml | NK1915 | Genel Endüstriyel Kullanım | |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1916 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Praseodymium (Pr) Sputtering Targets | NK1917 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Indium Phosphide Quantum Dots (InP/ZnS QD) 480 nm | NK1918 | Genel Endüstriyel Kullanım | |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1919 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Nickel Oxide (NiO) Sputtering Targets | NK1920 | Genel Endüstriyel Kullanım | Purity: 99.98%, Size:2”, Thickness: 0.125” |
| Silicon Carbide (SiC) Sputtering Targets | NK1921 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK1922 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1923 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Carbon (C) Sputtering Targets | NK1924 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1925 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1926 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tin Oxide (SnO2) Sputtering Targets | NK1927 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1928 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1929 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, indium, Purity: 99.995%, Size: 3”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK1930 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Shape Memory Polymer NGM3520 | NK1931 | Genel Endüstriyel Kullanım | Ether Type |
| Titanium Carbide (TiC) Sputtering Targets | NK1932 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1933 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK1934 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Titanium Boride (TiB2) Sputtering Targets | NK1935 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1936 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1937 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1938 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 7”, Thickness: 0.250” |
| Yttrium (Y) Sputtering Targets | NK1939 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK1940 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1941 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Silicon Carbide (SiC) Sputtering Targets | NK1942 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK1943 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size:1”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK1944 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK1945 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.8%, Size: 1”, Thickness: 0.125” |
| Silicon Carbide (SiC) Sputtering Targets | NK1946 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Lithium (Li) Foil Thickness:0.5 mm | NK1947 | Genel Endüstriyel Kullanım | Width: 50 mm, Length: 1000 mm, Purity: 99.9% |
| Vanadium Oxide (VO2) Nanopowder/Nanoparticles | NK1948 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 30-60 nm |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK1949 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1950 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 3”, Thickness: 0.250” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 645 nm | NK1951 | Genel Endüstriyel Kullanım | |
| Silicon Carbide (SiC) Sputtering Targets | NK1952 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK1953 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Tungsten Titanium (TiW) Sputtering Targets | NK1954 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1955 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1956 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 3”, Thickness: 0.250”, Dark Gray to Black |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1957 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK1958 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 2”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1959 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 625 nm | NK1960 | Genel Endüstriyel Kullanım | |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1961 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lithium Nickel Cobalt Oxide (LiNi(1-x)CoxO2) Sputtering Targets | NK1962 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1963 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1964 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1965 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1966 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafers | NK1967 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready |
| Indium (In) Sputtering Targets | NK1968 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Boron (B) Sputtering Targets | NK1969 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafers | NK1970 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 640±25 μm, Single Side Polished, EPI-ready, Dopant: Silicon (N-type) |
| Tungsten (W) Sputtering Targets | NK1971 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1972 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1973 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1974 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 545 nm | NK1975 | Genel Endüstriyel Kullanım | |
| Tungsten Titanium (TiW) Sputtering Targets | NK1976 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK1977 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK1978 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK1979 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1980 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK1981 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1982 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1983 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 6”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK1984 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1985 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 6”, Thickness: 0.250”, Grey to Black |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK1986 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Multi Walled Carbon Nanotubes Array on Monocrystal Silicon | NK1987 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 960 µm |
| Multi Walled Carbon Nanotubes Array on Monocrystal Silicon | NK1988 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 180 µm |
| Multi Walled Carbon Nanotubes Array on Polycrystal Silicon | NK1989 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 960 µm |
| Multi Walled Carbon Nanotubes Array on Quartz | NK1990 | Genel Endüstriyel Kullanım | Height: 960 µm |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 525 nm | NK1991 | Genel Endüstriyel Kullanım | |
| Multi Walled Carbon Nanotubes Array on Quartz | NK1992 | Genel Endüstriyel Kullanım | Height: 490 µm |
| Multi Walled Carbon Nanotubes Array on Quartz | NK1993 | Genel Endüstriyel Kullanım | Height: 95 µm |
| Multi Walled Carbon Nanotubes Array on Polycrystal Silicon | NK1994 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 95 µm |
| Zinc (Zn) Sputtering Targets | NK1995 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Carbon Nanotube Fibres | NK1996 | Genel Endüstriyel Kullanım | Fiber Diameter: 5-12 µm, Tensile Strength 1200-1500 MPa, Electrical conductivity 5×10^4~7×10^4 S/m |
| Multi Walled Carbon Nanotubes Array on Monocrystal Silicon | NK1997 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 95 µm |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1998 | Genel Endüstriyel Kullanım | indium, Purity: 99.8%, Size: 2”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1999 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Multi Walled Carbon Nanotubes Array on Polycrystal Silicon | NK2000 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 490 µm |
| Carbon Nanotube Sponges | NK2001 | Genel Endüstriyel Kullanım | Size: 50 mm x 20 mm, Thickness: 1-2 mm |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK2002 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2003 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK2004 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2005 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK2006 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK2007 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2008 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2009 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2010 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK2011 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2012 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK2013 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2014 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK2015 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK2016 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2017 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK2018 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size:2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK2019 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK2020 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK2021 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2022 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK2023 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2024 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2025 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 480 nm | NK2026 | Genel Endüstriyel Kullanım | |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2027 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK2028 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK2029 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 3”, Thickness: 0.125”, Dark Gray to Black |
| Tantalum (Ta) Sputtering Targets | NK2030 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2031 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK2032 | Elektronik, Yarı İletkenler, Optik Malzemeler | indium, Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK2033 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Carbon (C) Sputtering Targets | NK2034 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2035 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK2036 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK2037 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2038 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 460 nm | NK2039 | Genel Endüstriyel Kullanım | |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2040 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2041 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK2042 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Aluminate (LaAlO3) Sputtering Targets | NK2043 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Titanium Boride (TiB2) Sputtering Targets | NK2044 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2045 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Tantalum (Ta) Sputtering Targets | NK2046 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2047 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Indium (In) Sputtering Targets | NK2048 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2049 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2050 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2051 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2052 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK2053 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, indium, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2054 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2055 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2056 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1”, Thickness: 0.250”, Beige to White |
| Titanium Carbide (TiC) Sputtering Targets | NK2057 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK2058 | Genel Endüstriyel Kullanım | Size: 8”, Orientation: (100), Boron Doped, Resistivity: 1-100 (ohm.cm), 1-Side Polished, Thickness: 725 ± 25 μm |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2059 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK2060 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Chromium (Cr) Sputtering Targets | NK2061 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| CQD-675-nm.webp | NK2062 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 675 nm | NK2063 | Genel Endüstriyel Kullanım | |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2064 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK2065 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2066 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK2067 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2068 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2069 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Carbon Quantum Dots (CQD) 630 nm | NK2070 | Genel Endüstriyel Kullanım | |
| Barium Fluoride (BaF2) Sputtering Targets | NK2071 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Yttrium (Y) Sputtering Targets | NK2072 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2073 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2074 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK2075 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Boron (B) Sputtering Targets | NK2076 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK2077 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 1000 ppm Dry powder |
| Barium (Ba) Sputtering Targets | NK2078 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Barium (Ba) Sputtering Targets | NK2079 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2080 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK2081 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 4”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK2082 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Indium Oxide (In2O3) Sputtering Targets | NK2083 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK2084 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2085 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 3”, Thickness: 0.125” |
| Titanium Boride (TiB2) Sputtering Targets | NK2086 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2087 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2088 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Antimony (Sb) Sputtering Targets | NK2089 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2090 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Gallium Arsenide (GaAs) Wafers | NK2091 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready, Mobility: 1000-3000 |
| Gallium Arsenide (GaAs) Wafers | NK2092 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Double Side Polished, EPI-ready |
| Gallium Arsenide (GaAs) Wafers | NK2093 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350± 25 μm, Orientation: 100, Single Side Polished, EPI-ready |
| Gallium Arsenide (GaAs) Wafers | NK2094 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625±25 μm, Single Side Polished, EPI-ready |
| Gallium Arsenide (GaAs) Wafers | NK2095 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 350±25 μm, Single Side Polished, EPI-ready |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2096 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2097 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2098 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK2099 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 6”, Thickness: 0.250” |
| Indium Oxide (In2O3) Sputtering Targets | NK2100 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2101 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2102 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2103 | Genel Endüstriyel Kullanım | indium, Purity: 99.9% , Size: 2”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2104 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK2105 | Seramik, Yarı İletken, Kimyasal Endüstri | elastomer, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Indium Oxide (In2O3) Sputtering Targets | NK2106 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Titanium Carbide (TiC) Sputtering Targets | NK2107 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Titanium Boride (TiB2) Sputtering Targets | NK2108 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| 565.webp | NK2109 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 565 nm | NK2110 | Genel Endüstriyel Kullanım | |
| Tin Oxide (SnO2) Sputtering Targets | NK2111 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size:2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2112 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2113 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Impending Self-Help Transfer Nickel Graphene Foam | NK2114 | Elektronik, Batarya Elektrotları, Sensörler | Thickness: 1±0.1 mm, Size: 5×5 cm |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK2115 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Yttrium (Y) Sputtering Targets | NK2116 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2117 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Indium Oxide (In2O3) Sputtering Targets | NK2118 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK2119 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Samarium (Sm) Micron Powder | NK2120 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| 535.webp | NK2121 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 535 nm | NK2122 | Genel Endüstriyel Kullanım | |
| Titanium Carbide (TiC) Sputtering Targets | NK2123 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2124 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK2125 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2126 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK2127 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK2128 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2129 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2130 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2131 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2132 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2133 | Pigment, Manyetik Malzemeler, Katalizörler | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK2134 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2135 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2136 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK2137 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2138 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2139 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 2”, Thickness: 0.250” |
| Germanium (Ge) Sputtering Targets | NK2140 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2141 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2142 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK2143 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2144 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Cobalt (Co) Nanopowder/Nanoparticles | NK2145 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 100 nm |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2146 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2147 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK2148 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK2149 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2150 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK2151 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK2152 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| 515.webp | NK2153 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 515 nm | NK2154 | Genel Endüstriyel Kullanım | |
| Titanium Nitride (TiN) Sputtering Targets | NK2155 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Lead Sulfide Quantum Dots (PbS QD) 1550 nm | NK2156 | Genel Endüstriyel Kullanım | |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2157 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2158 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Titanium Carbide (TiC) Sputtering Targets | NK2159 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| 505.webp | NK2160 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 505 nm | NK2161 | Genel Endüstriyel Kullanım | |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2162 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.99%, Size: 1”, Thickness: 0.125”, Beige to White |
| Cerium Oxide (CeO2) Sputtering Targets | NK2163 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2164 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| 440.webp | NK2165 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 440 nm | NK2166 | Genel Endüstriyel Kullanım | |
| Lead Sulfide Quantum Dots (PbS QD) 1450 nm | NK2167 | Genel Endüstriyel Kullanım | |
| Gallium Arsenide (GaAs) Wafers | NK2168 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 600±25 μm, Double Side Polished, EPI-ready |
| Perovskite Quantum Dots (CsPbI3) 670 nm | NK2169 | Genel Endüstriyel Kullanım | |
| Nickel Oxide (NiO) Sputtering Targets | NK2170 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size:2”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2171 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Lanthanum Aluminate (LaAlO3) Sputtering Targets | NK2172 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2173 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2174 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Lead Sulfide Quantum Dots (PbS QD) 1350 nm | NK2175 | Genel Endüstriyel Kullanım | |
| Fullerene-C70 | NK2176 | Genel Endüstriyel Kullanım | Purity: 95% |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK2177 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| 420.webp | NK2178 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 420 nm | NK2179 | Genel Endüstriyel Kullanım | |
| Lead Sulfide Quantum Dots (PbS QD) 1250 nm | NK2180 | Genel Endüstriyel Kullanım | |
| Tantalum (Ta) Sputtering Targets | NK2181 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2182 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK2183 | Elektronik, Yarı İletkenler, Optik Malzemeler | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK2184 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 4”, Thickness: 0.250” |
| Lead Sulfide Quantum Dots (PbS QD) 1150 nm | NK2185 | Genel Endüstriyel Kullanım | |
| Perovskite Quantum Dots (CsPbCl3) 410 nm | NK2186 | Genel Endüstriyel Kullanım | |
| Perovskite Quantum Dots (CsPbBr3) 510 nm | NK2187 | Genel Endüstriyel Kullanım | |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK2188 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2189 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 2”, Thickness: 0.250”, Beige to White |
| Zinc Sulfide (ZnS) Sputtering Targets | NK2190 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2191 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lead Sulfide Quantum Dots (PbS QD) 1050 nm | NK2192 | Genel Endüstriyel Kullanım | |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2193 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2194 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2195 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2196 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2197 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2198 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK2199 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lead Sulfide Quantum Dots (PbS QD) 950 nm | NK2200 | Genel Endüstriyel Kullanım | |
| Boron Carbide (B4C) Sputtering Targets | NK2201 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2202 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2203 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Carbon Nanotube Sponges | NK2204 | Genel Endüstriyel Kullanım | Size: 50 mm x 20 mm, Thickness: 3-4 mm |
| Lead Sulfide Quantum Dots (PbS QD) 850 nm | NK2205 | Genel Endüstriyel Kullanım | |
| Germanium (Ge) Micron Powder | NK2206 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Magnesium Oxide (MgO) Sputtering Targets | NK2207 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size:1”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2208 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK2209 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2210 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2211 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2212 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.8%, Size: 3”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2213 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.8%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2214 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK2215 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2216 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Manganese (Mn) Sputtering Targets | NK2217 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2218 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2219 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 7”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2220 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2221 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2222 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2223 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2224 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” , Grey to Black |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2225 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2226 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK2227 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2228 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2229 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Fullerene-C70 | NK2230 | Genel Endüstriyel Kullanım | Purity: 96% |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2231 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”, Grey to Black |
| Titanium Nitride (TiN) Sputtering Targets | NK2232 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2233 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2234 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafer | NK2235 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 300± 25 μm, Double Side Polished, EPI-ready |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2236 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2237 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK2238 | Genel Endüstriyel Kullanım | Indium Bonding, Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2239 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2240 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2241 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2242 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2243 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2244 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2245 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2246 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2247 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2248 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK2249 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2250 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 7”, Thickness: 0.250” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2251 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2252 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2253 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2254 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| InP-based QLED Quantum Dots 525 nm | NK2255 | Genel Endüstriyel Kullanım | |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2256 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2257 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Cd-based QLED Quantum Dots 465 nm | NK2258 | Genel Endüstriyel Kullanım | |
| Cd-based QLED Quantum Dots 525 nm | NK2259 | Genel Endüstriyel Kullanım | |
| Titanium Nitride (TiN) Sputtering Targets | NK2260 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Cd-based QLED Quantum Dots 625 nm | NK2261 | Genel Endüstriyel Kullanım | |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2262 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| ZnSe-based QLED Quantum Dots 455 nm | NK2263 | Genel Endüstriyel Kullanım | |
| InP-based QLED Quantum Dots 625 nm | NK2264 | Genel Endüstriyel Kullanım | |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2265 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2266 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2267 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2268 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2269 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK2270 | Genel Endüstriyel Kullanım | indium, Purity: 99.8%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2271 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2272 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Multi-Layer Accordion-Shaped Titanium Carbide ( Ti3C2Tx) MXene Phase Powder | NK2273 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 98+%, Size: ~400 mesh |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2274 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”, Beige to White |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2275 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 3”, Thickness: 0.125”, Beige to White |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2276 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2277 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2278 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2279 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Gold Nanostars | NK2280 | Genel Endüstriyel Kullanım | Size: 40-45 nm |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2281 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125”, Grey to Black |
| Zinc Oxide (ZnO) Sputtering Targets | NK2282 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2283 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK2284 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK2285 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK2286 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2287 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2288 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK2289 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2290 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2291 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2292 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2293 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK2294 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Boron (B) Sputtering Targets | NK2295 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2296 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2297 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2298 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.125” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2299 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2300 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2301 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2302 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2303 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2304 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Praseodymium (Pr) Sputtering Targets | NK2305 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Titanium Nitride (TiN) Sputtering Targets | NK2306 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2307 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Fullerene-C70 | NK2308 | Genel Endüstriyel Kullanım | Purity: 98% |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2309 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2310 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2311 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2312 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK2313 | Elektronik, Yarı İletkenler, Optik Malzemeler | indium, Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2314 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Nickel Oxide (NiO) Sputtering Targets | NK2315 | Genel Endüstriyel Kullanım | indium, Purity: 99.98%, Size: 2”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2316 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2317 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2318 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK2319 | Elektronik, Yarı İletkenler, Optik Malzemeler | indium, Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK2320 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2321 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK2322 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK2323 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2324 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Mechanical Grade, 4H Area: 80% |
| Single Walled Carbon Nanotubes Array on Monocrystal Silicon | NK2325 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 95 µm |
| Single Walled Carbon Nanotubes Array on Quartz | NK2326 | Genel Endüstriyel Kullanım | Height: 190 µm |
| Single Walled Carbon Nanotubes Array on Quartz | NK2327 | Genel Endüstriyel Kullanım | Height: 290 µm |
| Single Walled Carbon Nanotubes Array on Quartz | NK2328 | Genel Endüstriyel Kullanım | Height: 95 µm |
| Tungsten Oxide (WO3) Sputtering Targets | NK2329 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2330 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2331 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2332 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2333 | Pigment, Manyetik Malzemeler, Katalizörler | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Chips for Coin Cell Materials | NK2334 | Genel Endüstriyel Kullanım | Diameter: 16 mm, Thickness: 0.6 mm, 1500 pieces |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2335 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2336 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2337 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2338 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2339 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2340 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK2341 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2342 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 5”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK2343 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2344 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2345 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2346 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2347 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2348 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2349 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2350 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Nickel Oxide (NiO) Sputtering Targets | NK2351 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2352 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2353 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2354 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2355 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2356 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2357 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2358 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 4”, Thickness: 0.125” |
| Fullerene-C70 | NK2359 | Genel Endüstriyel Kullanım | Purity: 99% |
| Tungsten Oxide (WO3) Sputtering Targets | NK2360 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2361 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 3”, Thickness: 0.250”, Beige to White |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2362 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK2363 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2364 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2365 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2366 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2367 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2368 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2369 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2370 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2371 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK2372 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 4”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2373 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2374 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2375 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Single Walled Carbon Nanotubes Array on Monocrystal Silicon | NK2376 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 190 µm |
| Aluminum Nitride (AlN) Sputtering Targets | NK2377 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size:4”, Thickness: 0.250” |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK2378 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2379 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2380 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK2381 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Stainless Steel Three-Electrode Split Test Cell | NK2382 | Genel Endüstriyel Kullanım | |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2383 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2384 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2385 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK2386 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 2000 ppm Dry powder |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2387 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2388 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2389 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2390 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2391 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2392 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2393 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2394 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 5”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2395 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2396 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2397 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2398 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2399 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2400 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2401 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2402 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2403 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2404 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Praseodymium (Pr) Micron Powder | NK2405 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2406 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2407 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Magnetic Fe3O4@SiO2 powder | NK2408 | Genel Endüstriyel Kullanım | Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Positively-charged |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2409 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK2410 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2411 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK2412 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2413 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2414 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2415 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2416 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 7”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2417 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Cerium (Ce) Micron Powder | NK2418 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2419 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Impending Self-Help Transfer Nickel Graphene Foam | NK2420 | Elektronik, Batarya Elektrotları, Sensörler | Thickness: 1±0.1 mm, Size: 5×10 cm |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2421 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2422 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2423 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2424 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 7”, Thickness: 0.250” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2425 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2426 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2427 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK2428 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2429 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2430 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2431 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 3”, Thickness: 0.125”, Beige to White |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2432 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2433 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2434 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2435 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Mini Pellet Press | NK2436 | Genel Endüstriyel Kullanım | |
| Boron Nitride (BN) Sputtering Targets | NK2437 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2438 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2439 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2440 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2441 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.125” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2442 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2443 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 4”, Thickness: 0.125”, Beige to White |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2444 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2445 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2446 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2447 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK2448 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Glassy Carbon Foam for Battery and Supercapacitor Research | NK2449 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 100 mm x100 mm x 10 mm |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2450 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 8”, Thickness: 0.250”, Beige to White |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2451 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 6”, Thickness: 0.250”, Beige to White |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2452 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2453 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2454 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2455 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2456 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2457 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2458 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Zinc Selenide Discs | NK2459 | Genel Endüstriyel Kullanım | Purity: 99.99%, Dia:20mm, Thickness:3mm, 2-side polished |
| Indium Phosphide (InP) Wafers | NK2460 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350± 25 μm, Orientation: 111, Single Side Polished, Testing Grade |
| Multi-Layer Titanium Carbide (Ti2CTx) MXene Phase Powder | NK2461 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 98+%, Size: 2-20 µm |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2462 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2463 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2464 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Selenium (Se) Nanopowder/Nanoparticles | NK2465 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: < 100 nm |
| Silicon Carbide Wafer (SiC-4H)- 4H | NK2466 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Mechanical Grade, 4H Area: 95% |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2467 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2468 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Testing Grade, 4H Area: 80% |
| Fullerene-C70 | NK2469 | Genel Endüstriyel Kullanım | Purity: 99.5% |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2470 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 3”, Thickness: 350 μm, Production Grade, 4H Area: 100% |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2471 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 7”, Thickness: 0.125” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2472 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| 5V-10mA Coin Cell Battery Testing System | NK2473 | Genel Endüstriyel Kullanım | Dimension ( W*L*H) : 480*330*45 mm |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK2474 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 4000 ppm Dry powder |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2475 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 3”, Thickness: 350 μm, Testing Grade, 4H Area: 95% |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2476 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2477 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 4”, Thickness: 0.250”, Beige to White |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2478 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 3”, Thickness: 350 μm, Dummy Grade, 4H Area: 95% |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2479 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 7”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2480 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2481 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2482 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Gallium Antimonide (GaSb) Wafers | NK2483 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 111, Testing Grade |
| Gallium Antimonide (GaSb) Wafers | NK2484 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 100, Testing Grade |
| Tungsten Oxide (WO3) Sputtering Targets | NK2485 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2486 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| High Speed Homogenizer | NK2487 | Genel Endüstriyel Kullanım | 27.000 rpm |
| Barium Fluoride (BaF2) Sputtering Targets | NK2488 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2489 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2490 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Silicon Nanowires | NK2491 | Elektronik, Yarı İletkenler, Optik Malzemeler | Dia: 100-200nm, Length: >10um, Purity: 99% |
| Silver (Ag) Sputtering Targets | NK2492 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2493 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2494 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.99%, Size: 4”, Thickness: 0.125”, Beige to White |
| Platinum Foil | NK2495 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 0.5mm, 5×5 cm |
| Fullerene-C70 | NK2496 | Genel Endüstriyel Kullanım | Purity: 99.9% |
| Coin Cell Punching Machine | NK2497 | Genel Endüstriyel Kullanım | |
| Indium Phosphide (InP) Wafers | NK2498 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 111, Single Side Polished, Testing Grade |
| Indium Phosphide (InP) Wafers | NK2499 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, Testing Grade |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2500 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2501 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2502 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2503 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Silicon Carbide Wafer (SiC-6H) – 6H | NK2504 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Dummy Grade, Usable Area: 95% |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2505 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2506 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2507 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2508 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Silicon Carbide Wafer (SiC-4H)- 4H | NK2509 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 350 μm, Dummy Grade, 4H Area: 95% |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2510 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 350 μm, Mechanical Grade, 4H Area: 80% |
| Gallium Antimonide (GaSb) Wafers | NK2511 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 111, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2512 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 100, EPI-Ready |
| Platinum (Pt) Sputtering Targets | NK2513 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size:2”, Thickness: 0.125” |
| Hydraulic Crimping Machine for All Coin Cells | NK2514 | Genel Endüstriyel Kullanım | |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2515 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Production Grade, 4H Area: 1 |
| Shape Memory Polymer NGP4510 | NK2516 | Genel Endüstriyel Kullanım | Potting Type |
| Shape Memory Polymer NGP5510 | NK2517 | Genel Endüstriyel Kullanım | Potting Type |
| Shape Memory Polymer NGP3510 | NK2518 | Genel Endüstriyel Kullanım | Potting Type |
| Shape Memory Polymer NGP2510 | NK2519 | Genel Endüstriyel Kullanım | Potting Type |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2520 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 350 μm, Mechanical Grade, 4H Area: 100% |
| Indium Arsenide (InAs) Wafers | NK2521 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 100, EPI-Ready |
| Platinum Foil | NK2522 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 1 mm, 5×5 cm |
| Platinum (Pt) Sputtering Targets | NK2523 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Indium Phosphide (InP) Wafers | NK2524 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready |
| Indium Phosphide (InP) Wafers | NK2525 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2526 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 100, Testing Grade |
| Platinum (Pt) Sputtering Targets | NK2527 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Indium Phosphide (InP) Wafers | NK2528 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625± 25 μm, Orientation: 111, Single Side Polished, Testing Grade |
| Indium Phosphide (InP) Wafers | NK2529 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625± 25 μm, Orientation: 100, Single Side Polished, Testing Grade |
| Indium Phosphide (InP) Wafers | NK2530 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready, Dopant: Iron (N Type) |
| Silicon on Insulator (SOI) Wafers | NK2531 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 725 μm, P type (Boron doped) |
| Indium Phosphide (InP) Wafers | NK2532 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 111 , Single Side Polished, EPI-Ready, Dopant: Iron (N Type) |
| Electric Coin Cell Hydraulic Crimping Machine | NK2533 | Genel Endüstriyel Kullanım | |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2534 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 3”, Thickness: 350 μm, Research Grade, 4H Area: 95% |
| Pneumatic Cylindrical Battery Sealing Machine | NK2535 | Genel Endüstriyel Kullanım | |
| Platinum (Pt) Sputtering Targets | NK2536 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Platinum (Pt) Sputtering Targets | NK2537 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2538 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 350 μm, Testing Grade, 4H Area: 95% |
| Ultrasonic Homogenizer | NK2539 | Genel Endüstriyel Kullanım | |
| High Energy Ball Mill | NK2540 | Genel Endüstriyel Kullanım | |
| Indium Arsenide (InAs) Wafers | NK2541 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 100, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2542 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 100, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2543 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 111, Testing Grade |
| Gallium Antimonide (GaSb) Wafers | NK2544 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 111, EPI-Ready |
| Silver (Ag) Sputtering Targets | NK2545 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Silicon on Insulator (SOI) Wafers | NK2546 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 6”, Device Thickness: 625 nm, P type |
| Silicon on Insulator (SOI) Wafers | NK2547 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 8”, Device Thickness: 300 nm, P type |
| Silicon on Insulator (SOI) Wafers | NK2548 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 8”, Device Thickness: 600 nm, P type |
| Silicon on Insulator (SOI) Wafers | NK2549 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 6”, Device Thickness: 340 nm, P type |
| Pneumatic Die Cutting Machine For Battery Electrode Cutting | NK2550 | Genel Endüstriyel Kullanım | |
| Platinum (Pt) Sputtering Targets | NK2551 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Gallium Antimonide (GaSb) Wafers | NK2552 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 1000± 25 μm, Orientation: 100, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2553 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 1000± 25 μm, Orientation: 111, EPI-Ready |
| Indium Arsenide (InAs) Wafers | NK2554 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 1000± 25 μm, Orientation: 100, EPI-Ready |
| Platinum (Pt) Sputtering Targets | NK2555 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK2556 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dry powder |
| Platinum (Pt) Sputtering Targets | NK2557 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Shape Memory Polymer NGS5520 | NK2558 | Genel Endüstriyel Kullanım | Solution Type |
| Shape Memory Polymer NGS4520 | NK2559 | Genel Endüstriyel Kullanım | Solution Type |
| Shape Memory Polymer NGS3520 | NK2560 | Genel Endüstriyel Kullanım | Solution Type |
| Indium Phosphide (InP) Wafers | NK2561 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready |
| Indium Phosphide (InP) Wafers | NK2562 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready |
| Platinum Foil | NK2563 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 0.5mm, 10×10 cm |
| Platinum (Pt) Sputtering Targets | NK2564 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Platinum Foil | NK2565 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 1 mm, 10×10 cm |
| Large-Automatic-Film-Coater-_Doctor-Blade_.webp | NK2566 | Genel Endüstriyel Kullanım | |
| Large Automatic Film Coater (Doctor Blade) | NK2567 | Genel Endüstriyel Kullanım | |
| Platinum (Pt) Sputtering Targets | NK2568 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
Projelerimizde bize destek olmak istersen Patreon üzerinden aylık veya tek seferlik bağışta bulunabilirsin.
